SCHEMBL472161

SCHEMBL472161

[AlH3].[SiH4].[Ti]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29199128 1.00
SCHEMBL27813861 1.00
SCHEMBL28888620 0.87
SCHEMBL22319907 0.87
Ammonia Solution, Strong SCHEMBL14762761 0.87
Methane SCHEMBL23295086 0.87
Helium SCHEMBL18224586 0.87
SCHEMBL9769953 0.87
Water SCHEMBL28797773 0.87
SCHEMBL27744359 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 994 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117399637-B High-performance in-situ autogenous Ti5Si3Near-net forming method of phase reinforced titanium-aluminum-based composite material 南京理工大学 2026-05-12 CN claimed
US-20250309102-A1 METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE PREPARED BY USING THE SAME Innolux Corporation (TW) 2025-10-02 US claimed
CN-119876872-A Magnetron sputtering device improved cathode target external notch anode cover based on conventional column target discharge and use method 哈尔滨工业大学 2025-04-25 CN claimed
CN-119800279-A Device for rapidly and uniformly depositing thin film on inner wall of slender tube part by pre-ionized hollow cathode tube internal discharge and use method 哈尔滨工业大学 2025-04-11 CN claimed
CN-119776764-A Device for rapidly and uniformly depositing thin film on inner wall of hollow cathode slender pipe barrel based on water cooling and magnetic constraint and use method 哈尔滨工业大学 2025-04-08 CN claimed
CN-119776786-A Device for rapidly and uniformly depositing thin film on inner wall of slender pipe barrel by self-sputtering of hollow cathode and application method 哈尔滨工业大学 2025-04-08 CN claimed
CN-119710362-A Low-aluminum low-silicon titanium aluminum-based intermediate alloy and preparation method and application thereof 攀枝花学院 2025-03-28 CN claimed
CN-119680526-A Claus tail gas hydrogenation catalyst and preparation method and application thereof 中国石油化工股份有限公司 2025-03-25 CN claimed
CN-119614934-A Aluminum-silicon alloy flux purifying and titanium removing process 内蒙古蒙泰集团有限公司 2025-03-14 CN claimed
US-20250081593-A1 METHODS OF IMPROVING PMOS TRANSISTOR PERFORMANCE Applied Materials ,Inc (US) 2025-03-06 US claimed
CN-1570195-A Steel surface solid powder silicon-alumnium- titanium ternary coinfiltration method ZHAO GUANGLIANG (CN) 2005-01-26 CN claimed
CN-1472366-A Producing method for rare-earth aluminosilicate titanium alloy 北京科技大学 2004-02-04 CN claimed
CN-1116387-C Hydrocracking catalyst and hydrocracking method for hydrocarbon oils NIPON MITSUBISHI OIL CORP (JP) 2003-07-30 CN claimed
US-RE37032-E1 Layered and homogeneous films of aluminum and aluminum/silicon with titanium and tungsten for multilevel interconnects THE BOARD OF TRUSTEES OF THE LELAND STANFORD JR. UNIVERSITY 2001-01-30 US claimed
US-6132594-A USING A CATALYST SYSTEM WHICH INCLUDES A REACTOR PACKED OF A FLOW REACTOR APPARATUS WITH A HYDROCRACKING CATALYST COMPRISING A COMPLEX OXIDE, ZEOLITE, AND GROUP 6 AND/OR 8 METAL NIPPON MITSUBISHI OIL CORP. (JP) 2000-10-17 US claimed
CN-1236805-A Hydrocracking catalyst and hydrocracking method for hydrocarbon oils NIPPON MITSUBISHI OIL CORP (JP) 1999-12-01 CN claimed
EP-0950702-A2 Hydrocracking catalyst and hydrocracking method for hydrocarbon oils Nippon Mitsubishi Oil Corporation (JP) 1999-10-20 EP claimed
EP-0420589-B1 Process for forming deposited film and process for preparing semiconductor device CANON KK (JP) 1996-02-07 EP claimed
US-4896204-A MULTILAYER FILM FOR INTERCONNECTION, ALUMINUM, ALUMINUM ALLOY, ALUMINUM OXIDE MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 1990-01-23 US claimed
US-4673623-A REDUCING HILLOCK DENSITIES AND RESISTANCE THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY (US) 1987-06-16 US claimed