Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A3 | Q01959 | 13/20 | 0.49 |
| ▸ | SLC6A2 | P23975 | 12/20 | 0.49 |
| ▸ | SLC6A4 | P31645 | 8/20 | 0.49 |
| ▸ | DPP7 | Q9UHL4 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5499957 | 1.00 | SLC6A3 (0.49) | SLC6A3SLC6A2SLC6A4DPP7MAPT | |
| Hydrochloric Acid SCHEMBL10980809 | 0.98 | SLC6A3 (0.47) | SLC6A3SLC6A2SLC6A4DPP7MAPT | |
| SCHEMBL499846 | 0.98 | SLC6A3 (0.50) | SLC6A3SLC6A2SLC6A4DPP7 | |
| SCHEMBL4441694 | 0.98 | SLC6A3 (0.50) | SLC6A3SLC6A2SLC6A4DPP7 | |
| SCHEMBL19889439 | 0.93 | SLC6A3 (0.46) | SLC6A3SLC6A2SLC6A4DPP7SIGMAR1 | |
| SCHEMBL8529806 | 0.93 | SLC6A3 (0.46) | SLC6A3SLC6A2SLC6A4DPP7SIGMAR1 | |
| SCHEMBL3102765 | 0.89 | — | — | |
| SCHEMBL29519179 | 0.83 | SLC6A3 (0.58) | SLC6A3SLC6A2SLC6A4 | |
| SCHEMBL12635278 | 0.83 | SLC6A3 (0.45) | SLC6A3SLC6A2SLC6A4MAPTMAPK1 | |
| SCHEMBL12635275 | 0.83 | SLC6A3 (0.45) | SLC6A3SLC6A2SLC6A4MAPTMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 124 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118994618-A | Hyperbranched photosensitive resin with photoinitiation groups and LDI solder resist ink thereof | 深圳市百利合新材料发展有限公司 | 2024-11-22 | — | — | CN | disclosed |
| CN-118005561-A | Preparation and application of ionizable lipid molecules of benzaldehyde framework | 浙江工业大学 | 2024-05-10 | — | — | CN | disclosed |
| CN-116615411-A | Process for producing peptide compound containing N-substituted amino acid residue | 中外制药株式会社 | 2023-08-18 | — | — | CN | disclosed |
| WO-2022138891-A1 | METHOD FOR PRODUCING PEPTIDE COMPOUND CONTAINING N-SUBSTITUTED-AMINO ACID RESIDUE | 中外製薬株式会社 | 2022-06-30 | — | — | WO | disclosed |
| EP-2492746-B1 | Chemically amplified negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2019-11-20 | — | — | EP | disclosed |
| EP-2492747-B1 | Chemically amplified negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2018-11-07 | — | — | EP | disclosed |
| EP-2270596-B1 | Positive resist compostion and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2018-07-25 | — | — | EP | disclosed |
| US-RE46765-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-27 | — | — | US | disclosed |
| US-RE46736-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| EP-2360525-B1 | Chemically amplified positive resist composition and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2017-08-23 | — | — | EP | disclosed |
| EP-1753752-A1 | HIGHLY SELECTIVE NOVEL AMIDATION METHOD | Takeda Pharmaceutical Company Limited (JP) | 2007-02-21 | — | — | EP | disclosed |
| WO-2005121133-A1 | HIGHLY SELECTIVE NOVEL AMIDATION METHOD | TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) | 2005-12-22 | — | — | WO | disclosed |
| WO-2002030897-A2 | COMPOSITIONS AND METHODS FOR REGULATING THE NERVOUS SYSTEM | FILLION GILLES (FR) | 2002-04-18 | — | — | WO | disclosed |
| US-5622681-A | ION EXCHANGING HEAT STABLE SALT ANION WITH BASIC DIALYZING SOLUTION TO CONVERT TO HEAT REGENERABLE AMINE ABSORBENT; DONNAN EXCLUSION PRINCIPLES | THE DOW CHEMICAL COMPANY (US) | 1997-04-22 | — | — | US | disclosed |
| EP-0471592-B1 | Process for absorption of sulfur compounds from fluids using certain piperidines, piperazines, or anhydrides of monocarboxylic amino acids | DOW CHEMICAL CO (US) | 1995-08-09 | — | — | EP | disclosed |
| US-5236678-A | Process for absorption of sulfur compounds from fluids using piperidines | THE DOW CHEMICAL COMPANY (US) | 1993-08-17 | — | — | US | disclosed |
| EP-0552360-A1 | A COMPOSITION AND METHOD FOR SIMULTANEOUS ABSORPTION OF SULFUR DIOXIDE AND NITRIC OXIDE | THE DOW CHEMICAL COMPANY (US) | 1993-07-28 | — | — | EP | disclosed |
| WO-1993003825-A1 | A COMPOSITION AND METHOD FOR SIMULTANEOUS ABSORPTION OF SULFUR DIOXIDE AND NITRIC OXIDE | THE DOW CHEMICAL COMPANY (US) | 1993-03-04 | — | — | WO | disclosed |
| US-5167941-A | Sulfur dioxide; cationic polyelectrolyte stabilizers | THE DOW CHEMICAL COMPANY (US) | 1992-12-01 | — | — | US | disclosed |
| EP-0471592-A2 | Process for absorption of sulfur compounds from fluids using certain piperidines, piperazines, or anhydrides of monocarboxylic amino acids | THE DOW CHEMICAL COMPANY (US) | 1992-02-19 | — | — | EP | disclosed |