SCHEMBL4730610

SCHEMBL4730610

O=C(O)C(=CC(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NFE2L2 Q16236 1/20 0.61
AKR1C1 Q04828 3/20 0.57
KMT2A Q03164 3/20 0.55
MEN1 O00255 2/20 0.55
ALDH1A1 P00352 2/20 0.54
MAPK1 P28482 1/20 0.54
TDP1 Q9NUW8 1/20 0.54
HDAC1 Q13547 2/20 0.53
HDAC2 Q92769 2/20 0.53
HDAC3 O15379 1/20 0.53
NCOR2 Q9Y618 1/20 0.53
AKT1 P31749 1/20 0.52
CA12 O43570 1/20 0.48
CA1 P00915 1/20 0.48
CA2 P00918 1/20 0.48
CA9 Q16790 1/20 0.48
AKR1C2 P52895 2/20 0.47
PTGS2 P35354 1/20 0.47
RECQL P46063 2/20 0.47
MAPT P10636 2/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27489619 1.00 NFE2L2 (0.61) NFE2L2AKR1C1KMT2AMEN1ALDH1A1
SCHEMBL164579 0.84 AKR1C1 (0.59) NFE2L2AKR1C1KMT2AMEN1ALDH1A1
SCHEMBL165294 0.84 AKR1C1 (0.59) NFE2L2AKR1C1KMT2AMEN1ALDH1A1
SCHEMBL164580 0.84 AKR1C1 (0.59) NFE2L2AKR1C1KMT2AMEN1ALDH1A1
SCHEMBL29154091 0.83 NFE2L2 (0.57) NFE2L2AKR1C1KMT2AMEN1ALDH1A1
SCHEMBL4793306 0.82 CA12 (0.65) NFE2L2AKR1C1KMT2AMEN1ALDH1A1
Hydrochloric Acid SCHEMBL3674640 0.82 AKR1C1 (0.57) NFE2L2AKR1C1KMT2AMEN1ALDH1A1
SCHEMBL8440602 0.80 AKR1C1 (0.55) NFE2L2AKR1C1KMT2AMEN1ALDH1A1
SCHEMBL9248773 0.80 AKR1C1 (0.55) NFE2L2AKR1C1KMT2AMEN1ALDH1A1
SCHEMBL9248787 0.80 AKR1C1 (0.55) NFE2L2AKR1C1KMT2AMEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12018107-B2 Polymer material, composition, and method of manufacturing semiconductor device KIOXIA CORPORATION (JP) 2024-06-25 US disclosed
US-20220049036-A1 POLYMER MATERIAL, COMPOSITION, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE TOSHIBA MEMORY CORPORATION (JP) 2022-02-17 US disclosed
US-11192972-B2 Polymer material, composition, and method of manufacturing semiconductor device TOSHIBA MEMORY CORPORATION (JP) 2021-12-07 US disclosed
US-20200291156-A1 POLYMER MATERIAL, COMPOSITION, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE TOSHIBA MEMORY CORPORATION (JP) 2020-09-17 US disclosed
WO-2008060844-A1 POLYMERIZATION INHIBITOR COMPOSITIONS, THEIR PREPARATION, AND THEIR USE ALBEMARLE CORPORATION (US) 2008-05-22 WO disclosed