⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29910 | 0.77 | — | — | |
| SCHEMBL4438124 | 0.76 | — | — | |
| SCHEMBL7869360 | 0.74 | — | — | |
| SCHEMBL11589019 | 0.73 | — | — | |
| SCHEMBL28931653 | 0.72 | — | — | |
| SCHEMBL474610 | 0.72 | ALDH1A1 (0.34) | — | |
| SCHEMBL9123116 | 0.71 | — | — | |
| SCHEMBL64126 | 0.71 | — | — | |
| SCHEMBL28953587 | 0.70 | — | — | |
| SCHEMBL11590038 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3268997-A1 | PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY | Versum Materials US, LLC (US) | 2018-01-17 | — | — | EP | claimed |
| WO-2016144960-A1 | PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-09-15 | — | — | WO | claimed |
| EP-2412011-A1 | CHEMICAL VAPOR DEPOSITION METHOD | Tokyo Electron Limited (JP) | 2012-02-01 | — | — | EP | claimed |
| WO-2010111313-A1 | CHEMICAL VAPOR DEPOSITION METHOD | TOKYO ELECTRON LIMITED (JP) | 2010-09-30 | — | — | WO | claimed |
| EP-3277696-A1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS | Versum Materials US, LLC (US) | 2018-02-07 | — | — | EP | disclosed |
| CN-107660209-A | Boron-containing compounds, compositions and methods for depositing boron-containing films | 弗萨姆材料美国有限责任公司 | 2018-02-02 | — | — | CN | disclosed |
| EP-3268997-A1 | PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY | Versum Materials US, LLC (US) | 2018-01-17 | — | — | EP | disclosed |
| WO-2016160800-A1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-10-06 | — | — | WO | disclosed |
| WO-2016144960-A1 | PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-09-15 | — | — | WO | disclosed |
| CN-102569179-B | Form material and the method in controlled space | 气体产品与化学公司 | 2016-08-03 | — | — | CN | disclosed |
| EP-2412011-A1 | CHEMICAL VAPOR DEPOSITION METHOD | Tokyo Electron Limited (JP) | 2012-02-01 | — | — | EP | disclosed |
| WO-2010111313-A1 | CHEMICAL VAPOR DEPOSITION METHOD | TOKYO ELECTRON LIMITED (JP) | 2010-09-30 | — | — | WO | disclosed |