⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL3951699 | 0.90 | ALDH1A1 (0.60) | — | |
| Sulfuric Acid SCHEMBL270945 | 0.90 | — | — | |
| Sulfuric Acid SCHEMBL28557864 | 0.88 | ALDH1A1 (0.56) | — | |
| Sulfuric Acid SCHEMBL7733310 | 0.88 | ALDH1A1 (0.56) | — | |
| Sulfuric Acid SCHEMBL20377412 | 0.88 | ALDH1A1 (0.56) | — | |
| Sulfuric Acid SCHEMBL7072530 | 0.88 | ALDH1A1 (0.56) | — | |
| Sulfuric Acid SCHEMBL7072523 | 0.88 | ALDH1A1 (0.56) | — | |
| Sulfuric Acid SCHEMBL6159499 | 0.88 | ALDH1A1 (0.56) | — | |
| Sulfuric Acid SCHEMBL6159491 | 0.88 | ALDH1A1 (0.56) | — | |
| Allylamine SCHEMBL1743430 | 0.85 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102026738-B | Method for producing water-resistant polarizing film | NITTO DENKO CORP | 2014-04-16 | — | — | CN | claimed |
| CN-102026738-A | Method for producing water-resistant polarizing film | NITTO DENKO CORP | 2011-04-20 | — | — | CN | claimed |
| EP-4410383-B1 | CELLULOSIC PARTICLE | FUJIFILM BUSINESS INNOVATION CORP (JP) | 2026-04-22 | — | — | EP | disclosed |
| EP-4223273-B1 | CELLULOSIC PARTICLE | FUJIFILM BUSINESS INNOVATION CORP (JP) | 2026-01-28 | — | — | EP | disclosed |
| EP-4410873-B1 | CELLULOSIC PARTICLE | FUJIFILM BUSINESS INNOVATION CORP (JP) | 2025-11-19 | — | — | EP | disclosed |
| US-12460054-B2 | Cellulosic particle | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2025-11-04 | — | — | US | disclosed |
| US-12325779-B2 | Cellulosic particle | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2025-06-10 | — | — | US | disclosed |
| US-12187861-B2 | Cellulosic particle | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2025-01-07 | — | — | US | disclosed |
| US-20240327619-A1 | CELLULOSE PARTICLES AND METHOD FOR PRODUCING CELLULOSE PARTICLES | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2024-10-03 | — | — | US | disclosed |
| US-20240327618-A1 | CELLULOSE PARTICLES | FUJIFILM BUSINESS INNOVATION CORP. (JP) | 2024-10-03 | — | — | US | disclosed |
| EP-4438668-A1 | CELLULOSE PARTICLES AND METHOD FOR PRODUCING CELLULOSE PARTICLES | FUJIFILM Business Innovation Corp. (JP) | 2024-10-02 | — | — | EP | disclosed |
| EP-3116044-A1 | SHEATHING MATERIAL FOR LITHIUM BATTERIES | Toppan Printing Co., Ltd. (JP) | 2017-01-11 | — | — | EP | disclosed |
| US-20160372720-A1 | LITHIUM BATTERY PACKAGING MATERIAL | TOPPAN PRINTING CO., LTD. (JP) | 2016-12-22 | — | — | US | disclosed |
| US-9123922-B2 | Lithium ion battery exterior material | TOPPAN PRINTING CO., LTD. (JP) | 2015-09-01 | — | — | US | disclosed |
| CN-102026738-B | Method for producing water-resistant polarizing film | NITTO DENKO CORP | 2014-04-16 | — | — | CN | disclosed |
| US-8664171-B2 | Nitrated extreme pressure additives and blends | DOVER CHEMICAL CORPORATION (US) | 2014-03-04 | — | — | US | disclosed |
| EP-2629348-A1 | EXTERIOR MATERIAL FOR LITHIUM ION BATTERY | Toppan Printing Co., Ltd. (JP) | 2013-08-21 | — | — | EP | disclosed |
| US-20130209868-A1 | LITHIUM ION BATTERY EXTERIOR MATERIAL | TOPPAN PRINTING CO.,LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| CN-102026738-A | Method for producing water-resistant polarizing film | NITTO DENKO CORP | 2011-04-20 | — | — | CN | disclosed |
| US-20080305974-A1 | NITRATED EXTREME PRESSURE ADDITIVES AND BLENDS | DOVER CHEMICAL CORPORATION (US) | 2008-12-11 | — | — | US | disclosed |