SCHEMBL4763014

SCHEMBL4763014

OCCOc1ccc(C2(c3ccc(OCCO)c(OCCO)c3)c3ccccc3-c3ccccc32)cc1OCCO

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.45
ESR2 Q92731 1/20 0.45
PDK2 Q15119 6/20 0.44
KDM4E B2RXH2 3/20 0.41
SMN1; SMN2 Q16637 3/20 0.41
KMT2A Q03164 2/20 0.41
LMNA P02545 2/20 0.41
MEN1 O00255 1/20 0.41
MAPT P10636 1/20 0.41
OPRK1 P41145 1/20 0.41
IDO1 P14902 1/20 0.41
ALDH1A1 P00352 2/20 0.37
RECQL P46063 1/20 0.37
HTR7 P34969 1/20 0.36
AR P10275 1/20 0.35
ALOX5AP P20292 1/20 0.35
FEN1 P39748 1/20 0.35
GAA P10253 1/20 0.35
TP53 P04637 1/20 0.34
MAPK1 P28482 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30063510 1.00 ESR1 (0.45) ESR1ESR2PDK2KDM4ESMN1; SMN2
SCHEMBL22829520 0.93 PDK2 (0.45) ESR1ESR2PDK2KDM4ESMN1; SMN2
SCHEMBL22829515 0.92 ESR1 (0.41) ESR1ESR2PDK2KDM4ESMN1; SMN2
SCHEMBL31099332 0.92 ESR1 (0.41) ESR1ESR2PDK2KDM4ESMN1; SMN2
SCHEMBL21295471 0.91 PDK2 (0.46) ESR1ESR2PDK2KDM4ESMN1; SMN2
SCHEMBL29616932 0.91 PDK2 (0.46) ESR1ESR2PDK2KDM4ESMN1; SMN2
SCHEMBL23878246 0.88 PDK2 (0.45) ESR1ESR2PDK2KDM4ESMN1; SMN2
SCHEMBL30314509 0.88 PDK2 (0.45) ESR1ESR2PDK2KDM4ESMN1; SMN2
SCHEMBL31734575 0.88 HTR7 (0.43) ESR1ESR2PDK2KDM4ESMN1; SMN2
SCHEMBL383247 0.88 HTR7 (0.43) ESR1ESR2PDK2KDM4ESMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3909744-B1 ANTIREFLECTION FILM AND MULTILAYER FILM HAVING ANTIREFLECTION FILM MITSUBISHI GAS CHEMICAL CO (JP) 2026-03-11 EP disclosed
EP-3943987-B1 ANTI-REFLECTION FILM LAMINATE, ANTI-REFLECTION FILM, AND METHOD FOR MANUFACTURING ANTI-REFLECTION FILM LAMINATE MITSUBISHI GAS CHEMICAL CO (JP) 2025-09-03 EP disclosed
US-12163053-B2 Antireflection film and multilayer film having antireflection film MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-12-10 US disclosed
US-20240240046-A1 ANTIREFLECTION FILM, LAMINATE HAVING ANTIREFLECTION FILM, AND METHOD FOR MANUFACTURING ANTIREFLECTION FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-07-18 US disclosed
CN-113467183-B Resin composition for forming insulating film, insulating film produced using the same, image display device, and method for producing insulating film 东友精细化工有限公司 2024-04-23 CN disclosed
EP-4349589-A1 ANTIREFLECTION FILM, LAMINATE HAVING ANTIREFLECTION FILM, AND METHOD FOR MANUFACTURING ANTIREFLECTION FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-04-10 EP disclosed
EP-3757625-B1 ANTI-REFLECTION FILM AND LAYERED PRODUCT FILM HAVING ANTI-REFLECTION FILM MITSUBISHI GAS CHEMICAL CO (JP) 2024-04-03 EP disclosed
US-11926126-B2 Anti-reflection film and layered product film having anti-reflection film MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-03-12 US disclosed
US-11884054-B2 Anti-reflection film laminate, anti-reflection film, and method for manufacturing anti-reflection film laminate MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-01-30 US disclosed
WO-2022255340-A1 ANTIREFLECTION FILM, LAMINATE HAVING ANTIREFLECTION FILM, AND METHOD FOR MANUFACTURING ANTIREFLECTION FILM 三菱瓦斯化学株式会社 2022-12-08 WO disclosed
EP-3943987-A1 ANTI-REFLECTION FILM LAMINATE, ANTI-REFLECTION FILM, AND METHOD FOR MANUFACTURING ANTI-REFLECTION FILM LAMINATE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-01-26 EP disclosed
EP-3909744-A1 ANTIREFLECTION FILM AND MULTILAYER FILM HAVING ANTIREFLECTION FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-11-17 EP disclosed
CN-108059733-B Porous film-forming composition, separator, electrochemical element, and method for producing electrode composite 东京应化工业株式会社 2021-10-26 CN disclosed
CN-113467183-A Resin composition for forming insulating film, insulating film manufactured using same, image display device, and method for manufacturing insulating film 东友精细化工有限公司 2021-10-01 CN disclosed
US-20210053330-A1 ANTI-REFLECTION FILM AND LAYERED PRODUCT FILM HAVING ANTI-REFLECTION FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-02-25 US disclosed
EP-3757625-A1 ANTI-REFLECTION FILM AND LAYERED PRODUCT FILM HAVING ANTI-REFLECTION FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-12-30 EP disclosed
WO-2019163829-A1 ANTI-REFLECTION FILM AND LAYERED PRODUCT FILM HAVING ANTI-REFLECTION FILM 三菱瓦斯化学株式会社 2019-08-29 WO disclosed
JP-5324080-B2 2013-10-23 JP disclosed
JP-2008285468-A FLUORENE SKELETON-HAVING URETHANE (METH)ACRYLATE AND ITS CURED PRODUCT OSAKA GAS CO LTD 2008-11-27 JP disclosed
JP-2008179777-A URETHAN (METH)ACRYLATE WITH FLUORENE SKELETON AND CURED PRODUCT OF THE SAME OSAKA GAS CO LTD 2008-08-07 JP disclosed