SCHEMBL476527

SCHEMBL476527

CC(C)(C)OOC(=O)c1ccc(C(=O)c2ccc(C(=O)OOC(C)(C)C)cc2)cc1

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.71
TSHR P16473 1/20 0.71
HSD17B10 Q99714 1/20 0.71
TDP1 Q9NUW8 1/20 0.71
ELANE P08246 7/20 0.47
LMNA P02545 3/20 0.43
SRD5A2 P31213 3/20 0.42
F2 P00734 1/20 0.41
MAPT P10636 2/20 0.39
HPGD P15428 2/20 0.39
ESR1 P03372 1/20 0.39
ESR2 Q92731 1/20 0.39
PKM P14618 1/20 0.39
HTT P42858 1/20 0.39
FABP2 P12104 1/20 0.39
PPARG P37231 1/20 0.39
PPARA Q07869 1/20 0.39
SLC22A12 Q96S37 1/20 0.39
SIRT1 Q96EB6 1/20 0.38
CA12 O43570 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11126724 0.94 TSHR (0.80) ALDH1A1TSHRHSD17B10TDP1ELANE
SCHEMBL2942675 0.93 ALDH1A1 (0.62) ALDH1A1TSHRHSD17B10TDP1ELANE
SCHEMBL1660474 0.93 TDP1 (0.86) ALDH1A1TSHRHSD17B10TDP1ELANE
SCHEMBL10985472 0.93 ALDH1A1 (0.62) ALDH1A1TSHRHSD17B10TDP1ELANE
Benzophenone SCHEMBL10622042 0.90 TDP1 (0.89) ALDH1A1TSHRHSD17B10TDP1ELANE
SCHEMBL10977252 0.89 ALDH1A1 (0.59) ALDH1A1TSHRHSD17B10TDP1ELANE
SCHEMBL9631510 0.87 ALDH1A1 (0.56) ALDH1A1TSHRHSD17B10TDP1ELANE
SCHEMBL476566 0.87 ALDH1A1 (0.56) ALDH1A1TSHRHSD17B10TDP1ELANE
SCHEMBL8896071 0.86 ALDH1A1 (0.69) ALDH1A1TSHRHSD17B10TDP1LMNA
SCHEMBL28647699 0.86 ALDH1A1 (0.75) ALDH1A1TSHRHSD17B10TDP1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025047023-A1 SILICONE-CONTAINING COPOLYMER, METHOD FOR PRODUCING SAME, CURABLE RESIN COMPOSITION, AND CURED PRODUCT JNC株式会社 2025-03-06 WO disclosed
WO-2025033304-A1 METHOD FOR MANUFACTURING LIQUID CRYSTAL ALIGNMENT FILM, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2025-02-13 WO disclosed
WO-2024071364-A1 POLYMER COMPOSITION AND SINGLE-LAYER RETARDATION MATERIAL 日産化学株式会社 2024-04-04 WO disclosed
WO-2024058169-A1 WEAK-ANCHORING LIQUID CRYSTAL ALIGNING AGENT AND LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2024-03-21 WO disclosed
WO-2024058164-A1 LIQUID CRYSTAL ALIGNING AGENT AND LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2024-03-21 WO disclosed
WO-2023171757-A1 POLYMER COMPOSITION, SINGLE LAYER PHASE DIFFERENCE MATERIAL, AND LIQUID CRYSTAL ALIGNMENT AGENT 日産化学株式会社 2023-09-14 WO disclosed
WO-2023140322-A1 WEAK-ANCHORING LIQUID CRYSTAL ALIGNMENT AGENT, AND LIQUID CYRSTAL DISPLAY ELEMENT 日産化学株式会社 2023-07-27 WO disclosed
WO-2023095925-A1 POLYMER COMPOSITION AND SINGLE-LAYER RETARDATION MATERIAL 日産化学株式会社 2023-06-01 WO disclosed
US-11560517-B2 Photoreactive liquid crystal composition, display element, optical element, method for manufacturing display element, and method for manufacturing optical element UNIVERSITY OF HYOGO (JP) 2023-01-24 US disclosed
CN-115551906-A Polymerizable composition, ink, transfer mold, and method for producing electrode member 捷恩智株式会社 2022-12-30 CN disclosed
US-20080124456-A1 Inkjet ink and method for forming cured film using the same CHISSO CORPORATION 2008-05-29 US disclosed
US-7371433-B2 Composition of silicon-containing copolymer, solvent-soluble crosslinked silicon-containing copolymer, and cured articles obtained therefrom AZ ELECTRONIC MATERIALS USA CORP. (US) 2008-05-13 US disclosed
US-20080103280-A1 Ink-jet ink and cured film obtained from same CHISSO CORPORATION 2008-05-01 US disclosed
US-20080038570-A1 A hydroxy-C4-12-alkyl acrylate, a di(meth)acrylate, and a photoinitiator; e.g., 4-hydroxybutyl methacrylate, bisphenol A bis(acryloyloxyethyl) ether, and 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-1-butanone; high sensitivity; soft and highly fine patterns CHISSO CORPORATION (JP) 2008-02-14 US disclosed
US-20070135602-A1 Fluorinated polymer and polymer composition CHISSO CORPORATION 2007-06-14 US disclosed
US-20070082968-A1 Fluorine-containing photocurable polymer composition CHISSO CORPORATION 2007-04-12 US disclosed
US-20050123774-A1 Composition of silicon-containing copolymer, solvent-soluble crosslinked silicon-containing copolymer, and cured articles obtained thereform MERCK PATENT GMBH (DE) 2005-06-09 US disclosed
EP-1500685-A1 COMPOSITION OF SILICON-CONTAINING COPOLYMER, SOLVENT-SOLUBLE CROSSLINKED SILICON-CONTAINING COPOLYMER, AND CURED ARTICLES OBTAINED THEREFROM CLARIANT INTERNATIONAL LTD. (CH) 2005-01-26 EP disclosed
US-6344299-B1 3,3',4,4'-BENZOPHENONETETRACARBOXYLIC DIANHYDRIDE DERIVATIVES CHISSO CORPORATION (JP) 2002-02-05 US disclosed
US-4752649-A IMPROVED RELATIVE THERMAL STABILITY AND EFFICIENT PHOTODECOMPOSITION BOWLING GREEN STATE UNIVERSITY (US) 1988-06-21 US disclosed