Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.50 |
| ▸ | GAA | P10253 | 2/20 | 0.50 |
| ▸ | HPGD | P15428 | 2/20 | 0.50 |
| ▸ | TLR8 | Q9NR97 | 5/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | TLR7 | Q9NYK1 | 1/20 | 0.45 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.45 |
| ▸ | ELANE | P08246 | 2/20 | 0.44 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.44 |
| ▸ | USP2 | O75604 | 1/20 | 0.44 |
| ▸ | GLA | P06280 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | CASP1 | P29466 | 1/20 | 0.44 |
| ▸ | CASP7 | P55210 | 1/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.44 |
| ▸ | CACNA2D1 | P54289 | 2/20 | 0.43 |
| ▸ | TACR3 | P29371 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17423155 | 1.00 | KDM4E (0.50) | KDM4EALDH1A1GAAHPGDTLR8 | |
| SCHEMBL28318282 | 1.00 | KDM4E (0.50) | KDM4EALDH1A1GAAHPGDTLR8 | |
| SCHEMBL28231497 | 1.00 | KDM4E (0.50) | KDM4EALDH1A1GAAHPGDTLR8 | |
| SCHEMBL28232527 | 0.98 | KDM4E (0.52) | KDM4EALDH1A1GAAHPGDTLR8 | |
| SCHEMBL476972 | 0.95 | KDM4E (0.52) | KDM4EALDH1A1GAAHPGDTLR8 | |
| SCHEMBL28241436 | 0.87 | KDM4E (0.55) | KDM4EALDH1A1GAAHPGDLMNA | |
| SCHEMBL10361949 | 0.82 | MAPT (0.45) | KDM4EMAPTTACR3ATM | |
| SCHEMBL8207670 | 0.80 | MAPT (0.43) | KDM4EMAPTTACR3ATM | |
| SCHEMBL20856714 | 0.79 | CACNA2D1 (0.54) | KDM4EALDH1A1GAAHPGDSLC2A1 | |
| SCHEMBL6266749 | 0.79 | KDM4E (0.53) | KDM4EALDH1A1GAAHPGDLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 129 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3685231-A1 | 3D PRINTING WITH POLYMERIC NANOGEL PARTICLES | The Regents Of The University Of Colorado, A Body Corporate, A Colorado Non-Profit (US) | 2020-07-29 | — | — | EP | claimed |
| CN-110357989-A | Tertiary amine photosensitizer, preparation method, comprising its photosensitive polymer combination and photosensitive polymer combination application | 常州强力电子新材料股份有限公司 | 2019-10-22 | — | — | CN | claimed |
| WO-2019056019-A1 | 3D PRINTING WITH POLYMERIC NANOGEL PARTICLES | THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) | 2019-03-21 | — | — | WO | claimed |
| WO-2023039393-A1 | IMPLANTABLE AND CONTINUOUS MULTI-ANALYTE MONITOR (MAM) SENSOR | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2023-03-16 | — | — | WO | disclosed |
| EP-3914965-A1 | OXIME ESTER PHOTOINITIATORS HAVING A SPECIAL AROYL CHROMOPHORE | BASF SE (DE) | 2021-12-01 | — | — | EP | disclosed |
| WO-2020152120-A1 | OXIME ESTER PHOTOINITIATORS HAVING A SPECIAL AROYL CHROMOPHORE | BASF SE (DE) | 2020-07-30 | — | — | WO | disclosed |
| EP-3685231-A1 | 3D PRINTING WITH POLYMERIC NANOGEL PARTICLES | The Regents Of The University Of Colorado, A Body Corporate, A Colorado Non-Profit (US) | 2020-07-29 | — | — | EP | disclosed |
| CN-105182688-B | The manufacturing method of photosensitive polymer combination, photosensitive element, the manufacturing method of resist figure and printed circuit board | 日立化成株式会社 | 2019-11-12 | — | — | CN | disclosed |
| CN-105474096-B | Radiation-sensitive resin composition, resin film, and electronic component | 日本瑞翁株式会社 | 2019-11-12 | — | — | CN | disclosed |
| CN-110426917-A | Photosensitive laminate and its manufacturing method | ASAHI KASEI CORP | 2019-11-08 | — | — | CN | disclosed |
| CN-110402275-A | Ultraviolet-curable ink composition, method of manufacturing bezel pattern in display substrate using the same, and bezel pattern manufactured thereby | LG CHEMICAL LTD | 2019-11-01 | — | — | CN | disclosed |
| WO-2005021824-A2 | PROCESS FOR THE PRODUCTION OF STRONGLY ADHERENT COATINGS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2005-03-10 | — | — | WO | disclosed |
| WO-2004104051-A1 | BIMOLECULAR PHOTOINITIATOR SYSTEMS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2004-12-02 | — | — | WO | disclosed |
| WO-2004065502-A1 | INK COMPOSITION FOR INKJET SPACER FORMATION AND SPACER ELEMENT USING THE SAME | LG CHEM, LTD. (KR) | 2004-08-05 | — | — | WO | disclosed |
| WO-2004049070-A2 | PHOTOSENSITIVE RESIN COMPOSITION COMPRISING A HALOGEN-FREE COLORANT | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2004-06-10 | — | — | WO | disclosed |
| EP-1410109-A1 | PHOTOSENSITIVE RESIN COMPOSITION | Ciba SC Holding AG (CH) | 2004-04-21 | — | — | EP | disclosed |
| EP-1395615-A1 | OXIME ESTER PHOTOINITIATORS HAVING A COMBINED STRUCTURE | Ciba SC Holding AG (CH) | 2004-03-10 | — | — | EP | disclosed |
| WO-2004008251-A1 | HEAT STABLE PHOTOCURABLE RESIN COMPOSITION FOR DRY FILM RESIST | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2004-01-22 | — | — | WO | disclosed |
| WO-2003010602-A1 | PHOTOSENSITIVE RESIN COMPOSITION | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2003-02-06 | — | — | WO | disclosed |
| WO-2002100903-A1 | OXIME ESTER PHOTOINITIATORS HAVING A COMBINED STRUCTURE | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2002-12-19 | — | — | WO | disclosed |