Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.52 |
| ▸ | GAA | P10253 | 1/20 | 0.52 |
| ▸ | HPGD | P15428 | 1/20 | 0.52 |
| ▸ | TLR8 | Q9NR97 | 2/20 | 0.49 |
| ▸ | TLR7 | Q9NYK1 | 1/20 | 0.49 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.48 |
| ▸ | CACNA2D1 | P54289 | 8/20 | 0.44 |
| ▸ | PARP1 | P09874 | 1/20 | 0.44 |
| ▸ | ACP1 | P24666 | 1/20 | 0.42 |
| ▸ | APP | P05067 | 1/20 | 0.41 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28232527 | 0.96 | KDM4E (0.52) | KDM4EALDH1A1GAAHPGDTLR8 | |
| SCHEMBL476955 | 0.95 | KDM4E (0.50) | KDM4EALDH1A1GAAHPGDTLR8 | |
| SCHEMBL28231497 | 0.95 | KDM4E (0.50) | KDM4EALDH1A1GAAHPGDTLR8 | |
| SCHEMBL17423155 | 0.95 | KDM4E (0.50) | KDM4EALDH1A1GAAHPGDTLR8 | |
| SCHEMBL28318282 | 0.95 | KDM4E (0.50) | KDM4EALDH1A1GAAHPGDTLR8 | |
| SCHEMBL28241436 | 0.89 | KDM4E (0.55) | KDM4EALDH1A1GAAHPGDKCNH2 | |
| SCHEMBL8211957 | 0.81 | TACR3 (0.42) | KDM4EALDH1A1HPGDTLR8TLR7 | |
| SCHEMBL6266749 | 0.80 | KDM4E (0.53) | KDM4EALDH1A1GAAHPGDKCNH2 | |
| SCHEMBL8207670 | 0.78 | MAPT (0.43) | KDM4E | |
| SCHEMBL8190259 | 0.76 | KDM4E (0.50) | KDM4EALDH1A1GAAHPGDKCNH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 88 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3914965-A1 | OXIME ESTER PHOTOINITIATORS HAVING A SPECIAL AROYL CHROMOPHORE | BASF SE (DE) | 2021-12-01 | — | — | EP | disclosed |
| WO-2020152120-A1 | OXIME ESTER PHOTOINITIATORS HAVING A SPECIAL AROYL CHROMOPHORE | BASF SE (DE) | 2020-07-30 | — | — | WO | disclosed |
| CN-106536644-B | Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate by using same and frame pattern manufactured by using same | 株式会社LG化学 | 2019-10-18 | — | — | CN | disclosed |
| CN-104749884-B | Photosensitive polymer combination | 东京应化工业株式会社 | 2019-10-18 | — | — | CN | disclosed |
| CN-107004384-B | Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate using same, and frame pattern manufactured thereby | 株式会社LG化学 | 2019-09-06 | — | — | CN | disclosed |
| CN-106488959-B | Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate by using same, and frame pattern manufactured by using same | 株式会社LG化学 | 2019-08-23 | — | — | CN | disclosed |
| CN-103076719-B | The manufacturing method of photosensitive polymer combination, photosensitive element, the forming method of corrosion-resisting pattern and printing distributing board | 日立化成株式会社 | 2019-08-09 | — | — | CN | disclosed |
| CN-110114376-A | Curable composition, method for producing cured product, cured product thereof, and adhesive using same | 株式会社ADEKA | 2019-08-09 | — | — | CN | disclosed |
| CN-105190440-B | Photosensitive resin composition, optical spacer, color filter protective film, and touch panel protective film or insulating film | 三洋化成工业株式会社 | 2019-08-06 | — | — | CN | disclosed |
| CN-110083010-A | The manufacturing method of photosensitive polymer combination, photosensitive film, permanent resist and permanent resist | 日立化成株式会社 | 2019-08-02 | — | — | CN | disclosed |
| EP-1520209-A1 | HEAT STABLE PHOTOCURABLE RESIN COMPOSITION FOR DRY FILM RESIST | Ciba SC Holding AG (CH) | 2005-04-06 | — | — | EP | disclosed |
| WO-2004065502-A1 | INK COMPOSITION FOR INKJET SPACER FORMATION AND SPACER ELEMENT USING THE SAME | LG CHEM, LTD. (KR) | 2004-08-05 | — | — | WO | disclosed |
| WO-2004050653-A2 | OXIME ESTER PHOTOINITIATORS WITH HETEROAROMATIC GROUPS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2004-06-17 | — | — | WO | disclosed |
| EP-1410109-A1 | PHOTOSENSITIVE RESIN COMPOSITION | Ciba SC Holding AG (CH) | 2004-04-21 | — | — | EP | disclosed |
| EP-1395615-A1 | OXIME ESTER PHOTOINITIATORS HAVING A COMBINED STRUCTURE | Ciba SC Holding AG (CH) | 2004-03-10 | — | — | EP | disclosed |
| WO-2004008251-A1 | HEAT STABLE PHOTOCURABLE RESIN COMPOSITION FOR DRY FILM RESIST | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2004-01-22 | — | — | WO | disclosed |
| WO-2003010602-A1 | PHOTOSENSITIVE RESIN COMPOSITION | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2003-02-06 | — | — | WO | disclosed |
| WO-2002100903-A1 | OXIME ESTER PHOTOINITIATORS HAVING A COMBINED STRUCTURE | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2002-12-19 | — | — | WO | disclosed |
| EP-1163553-A1 | OXIME DERIVATIVES AND THE USE THEREOF AS PHOTOINITIATORS | Ciba SC Holding AG (CH) | 2001-12-19 | — | — | EP | disclosed |
| WO-2000052530-A1 | OXIME DERIVATIVES AND THE USE THEREOF AS PHOTOINITIATORS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2000-09-08 | — | — | WO | disclosed |