⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8520644 | 0.67 | — | — | |
| SCHEMBL9777724 | 0.67 | — | — | |
| SCHEMBL9721266 | 0.67 | — | — | |
| SCHEMBL2885270 | 0.65 | — | — | |
| SCHEMBL2082322 | 0.65 | — | — | |
| SCHEMBL1332124 | 0.65 | — | — | |
| SCHEMBL4699 | 0.65 | — | — | |
| SCHEMBL8520542 | 0.62 | — | — | |
| SCHEMBL9550655 | 0.61 | — | — | |
| SCHEMBL644103 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111644207-B | Method for catalyzing dehydroboration of alkyne compounds | 苏州大学 | 2023-05-12 | — | — | CN | claimed |
| CN-111644207-A | Method for catalyzing dehydroboronation reaction of alkyne compound | 苏州大学 | 2020-09-11 | — | — | CN | claimed |
| CN-100410420-C | Method of forming low dielectric constant interlayer dielectric film | AIR PROD & CHEM (US) | 2008-08-13 | — | — | CN | claimed |
| EP-1191072-B1 | Electropolymerization modified carbon black and articles including tires having at least one component containing such modified carbon black | GOODYEAR TIRE & RUBBER (US) | 2006-01-04 | — | — | EP | claimed |
| CN-1644753-A | Method of forming low dielectric constant interlayer dielectric film | AIR PROD & CHEM (US) | 2005-07-27 | — | — | CN | claimed |
| US-6583048-B2 | Chemical vapor deposition from a silyl ether, a silyl ether oligomer, or an organosilicon compound containing one or more reactive groups, to form an interlayer dielectric film having a dielectric constant of 3.5 or less. | AIR PRODUCTS AND CHEMICALS, INC. | 2003-06-24 | — | — | US | claimed |
| US-20020142579-A1 | ORGANOSILICON PRECURSORS FOR INTERLAYER DIELECTRIC FILMS WITH LOW DIELECTRIC CONSTANTS | VERSUM MATERIALS US, LLC | 2002-10-03 | — | — | US | claimed |
| CN-1367205-A | Organosilicon precursors for low dielectric constant interlayer dielectric films | AIR PROD & CHEM (US) | 2002-09-04 | — | — | CN | claimed |
| EP-1225194-A2 | Method of forming a dielectric interlayer film with organosilicon precursors | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2002-07-24 | — | — | EP | claimed |
| EP-0626977-B1 | ABC TRIBLOCK METHACRYLATE POLYMERS | DU PONT (US) | 1997-07-09 | — | — | EP | claimed |
| EP-0308867-B1 | Alkenylsilylazetidinone intermediates for carbapenems | SHIONOGI & CO (JP) | 1995-07-26 | — | — | EP | claimed |
| EP-0096596-B2 | Microelectronic device manufacture | NEC CORP (JP) | 1994-03-23 | — | — | EP | claimed |
| CN-111644207-B | Method for catalyzing dehydroboration of alkyne compounds | 苏州大学 | 2023-05-12 | — | — | CN | disclosed |
| CN-115974948-A | Preparation method of etonogestrel | 湖南科益新生物医药有限公司 | 2023-04-18 | — | — | CN | disclosed |
| WO-2020240400-A1 | PROCESSES FOR PRODUCING ORTHOESTERS FROM ORGANOSULFUR COMPOUNDS | SCE FRANCE (FR) | 2020-12-03 | — | — | WO | disclosed |
| CN-111644207-A | Method for catalyzing dehydroboronation reaction of alkyne compound | 苏州大学 | 2020-09-11 | — | — | CN | disclosed |
| US-20190023815-A1 | METHOD OF PREPARING RUBBER COMPOSITION INCLUDING SYNDIOTACTIC 1,2-POLYBUTADIENE | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2019-01-24 | — | — | US | disclosed |
| EP-1225194-B2 | Method of forming a dielectric interlayer film with organosilicon precursors | AIR PROD & CHEM (US) | 2013-09-18 | — | — | EP | disclosed |
| EP-1225194-B1 | Method of forming a dielectric interlayer film with organosilicon precursors | AIR PROD & CHEM (US) | 2008-10-01 | — | — | EP | disclosed |
| US-6583048-B2 | Chemical vapor deposition from a silyl ether, a silyl ether oligomer, or an organosilicon compound containing one or more reactive groups, to form an interlayer dielectric film having a dielectric constant of 3.5 or less. | AIR PRODUCTS AND CHEMICALS, INC. | 2003-06-24 | — | — | US | disclosed |