SCHEMBL4771702

SCHEMBL4771702

CCC(C)CC(O[SiH3])C(C)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2769493 0.79
SCHEMBL2772993 0.73
SCHEMBL4771676 0.73 TSHR (0.36)
SCHEMBL23092258 0.72
SCHEMBL19356711 0.71
SCHEMBL2769582 0.71
SCHEMBL703116 0.71
SCHEMBL27646945 0.70
SCHEMBL5908908 0.70 SMPD1 (0.36)
SCHEMBL20610170 0.68 PTPN1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220213129-A1 SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR PRODUCING SILICON OXIDE FILM SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) 2022-07-07 US disclosed
CN-113785085-A Silicon oxide film, material for gas barrier film, and method for producing silicon oxide film 东曹株式会社 2021-12-10 CN disclosed
EP-1832351-B1 Low dielectric materials and methods for making same AIR PROD & CHEM (US) 2008-11-12 EP disclosed
EP-1837086-A2 Low dielectric materials and methods for making same Air Products and Chemicals, Inc. (US) 2007-09-26 EP disclosed
EP-1832351-A2 Low dielectric materials and methods for making same Air Products and Chemicals, Inc. (US) 2007-09-12 EP disclosed
US-20050260420-A1 Low dielectric materials and methods for making same VERSUM MATERIALS US, LLC 2005-11-24 US disclosed
EP-1464410-A1 Low dielectric materials and methods for making same AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-10-06 EP disclosed