SCHEMBL4773878

SCHEMBL4773878

C/C(=C\c1cccc2cc(O)ccc12)C(N)=O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.42
PARP1 P09874 1/20 0.38
TLR8 Q9NR97 1/20 0.38
CLK1 P49759 2/20 0.36
DYRK1A Q13627 2/20 0.36
DYRK1B Q9Y463 2/20 0.36
MTNR1A P48039 2/20 0.36
MTNR1B P49286 2/20 0.36
ESR1 P03372 2/20 0.36
ESR2 Q92731 2/20 0.36
THRA P10827 1/20 0.36
THRB P10828 1/20 0.36
GAA P10253 3/20 0.36
ALDH1A1 P00352 2/20 0.36
LMNA P02545 1/20 0.36
GLA P06280 1/20 0.36
HPGD P15428 1/20 0.36
CASP1 P29466 1/20 0.36
BRCA1 P38398 1/20 0.36
CASP7 P55210 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4773879 1.00 KDM4E (0.42) KDM4EPARP1TLR8CLK1DYRK1A
SCHEMBL31602276 0.83 KDM4E (0.57) KDM4EMTNR1AMTNR1BGAAALDH1A1
SCHEMBL553714 0.83 KDM4E (0.57) KDM4EMTNR1AMTNR1BGAAALDH1A1
SCHEMBL553715 0.83 KDM4E (0.57) KDM4EMTNR1AMTNR1BGAAALDH1A1
SCHEMBL1521190 0.82 KDM4E (0.50) KDM4EMTNR1AMTNR1BGAAALDH1A1
SCHEMBL27762326 0.76 GUSB (0.48) KDM4EGAAALDH1A1GLAHPGD
SCHEMBL29956684 0.74 ERN1 (0.44) TLR8CLK1DYRK1ADYRK1BESR1
SCHEMBL3067367 0.74 ERN1 (0.44) TLR8CLK1DYRK1ADYRK1BESR1
SCHEMBL7449933 0.73 AKR1C3 (0.43) KDM4EPARP1LMNAHSD17B10POLB
SCHEMBL8746683 0.72 AKR1C3 (0.50) KDM4EMTNR1AMTNR1BESR1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080241752-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
EP-1975717-A2 Positive resist compostion and pattern forming method using the same FUJIFILM Corporation (JP) 2008-10-01 EP disclosed