SCHEMBL4782258

SCHEMBL4782258

ClCc1cccnc1-c1ccccn1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 7/20 0.48
LMNA P02545 3/20 0.48
CCR1 P32246 3/20 0.48
CCR5 P51681 3/20 0.48
CCR8 P51685 3/20 0.48
CYP1A2 P05177 1/20 0.48
POLB P06746 1/20 0.48
METAP1 P53582 1/20 0.48
BLM P54132 1/20 0.48
HIF1A Q16665 1/20 0.48
DOHH Q9BU89 1/20 0.48
P4HTM Q9NXG6 1/20 0.48
NPC1 O15118 5/20 0.42
RAB9A P51151 4/20 0.42
TP53 P04637 3/20 0.42
TDP1 Q9NUW8 2/20 0.42
ALOX15 P16050 2/20 0.42
HTT P42858 2/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
L3MBTL1 Q9Y468 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4781706 0.81 DPP4 (0.36) KDM4ELMNACCR1CCR5CCR8
SCHEMBL7036968 0.81 KDM4E (0.48) KDM4ELMNACCR1CCR5CCR8
SCHEMBL7855103 0.81 KDM4E (0.48) KDM4ELMNACCR1CCR5CCR8
SCHEMBL30098846 0.81 KDM4E (0.48) KDM4ELMNACCR1CCR5CCR8
SCHEMBL1275952 0.81 DPP4 (0.57) KDM4ELMNACCR1CCR5CCR8
SCHEMBL30595830 0.81 DPP4 (0.57) KDM4ELMNACCR1CCR5CCR8
SCHEMBL5089682 0.81 KDM4E (0.48) KDM4ELMNACCR1CCR5CCR8
SCHEMBL28365991 0.81 KDM4E (0.48) KDM4ELMNACCR1CCR5CCR8
SCHEMBL30551751 0.81 KDM4E (0.48) KDM4ELMNACCR1CCR5CCR8
SCHEMBL30888443 0.80 KDM4E (0.43) KDM4ELMNACCR1CCR5CCR8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110713868-A Post etch residue cleaning solution capable of removing titanium nitride 巴斯夫欧洲公司 2020-01-21 CN claimed
CN-118005919-A Ionic porous organic polymer based on boron fluoride fluorescence, preparation method and photocatalytic application thereof 常州大学 2024-05-10 CN disclosed
CN-112004845-B Resin composition, laminate, semiconductor wafer with resin composition layer, substrate, and semiconductor device 三菱瓦斯化学株式会社 2022-05-31 CN disclosed
CN-114402096-A Composition for tin-silver alloy electroplating comprising complexing agent 巴斯夫欧洲公司 2022-04-26 CN disclosed
CN-112004845-A Resin composition, laminate, semiconductor wafer with resin composition layer, substrate for mounting semiconductor with resin composition layer, and semiconductor device 三菱瓦斯化学株式会社 2020-11-27 CN disclosed
CN-110713868-A Post etch residue cleaning solution capable of removing titanium nitride 巴斯夫欧洲公司 2020-01-21 CN disclosed
CN-101023502-B 2,2 -bipyridine ligand, sensitizing dye and dye sensitized solar cell ECOLE POLYTECH 2010-07-28 CN disclosed
WO-2008034579-A1 2-HETEROCYCLYL-5-PHENOXYMETHYLPYRIDINE DERIVATIVES AS ANTICANCER AGENTS F. HOFFMANN-LA ROCHE AG (CH) 2008-03-27 WO disclosed
CN-101023502-A 2,2 -bipyridine ligand, sensitizing dye and dye sensitized solar cell ECOLE POLYTECH (CH) 2007-08-22 CN disclosed
EP-0958055-A4 POLY N-CYCLIC AROMATIC LIGANDS BONDED TO SOLID SUPPORTS FOR REMOVING AND CONCENTRATING IONS FROM SOLUTIONS IBC ADVANCED TECH INC (US) 2001-03-14 EP disclosed
EP-0958055-A1 POLY N-CYCLIC AROMATIC LIGANDS BONDED TO SOLID SUPPORTS FOR REMOVING AND CONCENTRATING IONS FROM SOLUTIONS IBC ADVANCED TECHNOLOGIES, INC. (US) 1999-11-24 EP disclosed
WO-1997049492-A1 POLY N-CYCLIC AROMATIC LIGANDS BONDED TO SOLID SUPPORTS FOR REMOVING AND CONCENTRATING IONS FROM SOLUTIONS IBC ADVANCED TECHNOLOGIES, INC. (US) 1997-12-31 WO disclosed
US-5310687-A Ruthenium and osmium compounds, analyzing biological materials IGEN, INC. (US) 1994-05-10 US disclosed