⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15923928 | 0.96 | — | — | |
| SCHEMBL17273056 | 0.78 | — | — | |
| SCHEMBL235657 | 0.75 | LMNA (0.32) | — | |
| SCHEMBL3114467 | 0.75 | — | — | |
| SCHEMBL233912 | 0.70 | — | — | |
| SCHEMBL26967996 | 0.69 | — | — | |
| SCHEMBL6170826 | 0.69 | — | — | |
| SCHEMBL687683 | 0.69 | — | — | |
| SCHEMBL25280250 | 0.67 | — | — | |
| SCHEMBL234849 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 388 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12588446-B2 | Surface treatment composition and method for producing wafer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2026-03-24 | — | — | US | claimed |
| US-12435416-B2 | Compositions and methods using same for non-conformal deposition of silicon containing films | VERSUM MATERIALS US, LLC (US) | 2025-10-07 | — | — | US | claimed |
| US-12421603-B2 | Composition for high temperature atomic layer deposition of high quality silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2025-09-23 | — | — | US | claimed |
| US-20250270698-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | VERSUM MATERIALS US, LLC | 2025-08-28 | — | — | US | claimed |
| EP-4493734-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | Versum Materials US, LLC (US) | 2025-01-22 | — | — | EP | claimed |
| CN-118974894-A | Surface treatment composition and method for producing wafer | 中央硝子株式会社 | 2024-11-15 | — | — | CN | claimed |
| CN-111193069-B | Electrolyte for electrochemical device, method for preparing the same, and electrochemical device | 三星电子株式会社 | 2024-11-01 | — | — | CN | claimed |
| CN-113056475-B | Deprotection method for peptide compound or amide compound and resin removal method in solid phase reaction and method for producing peptide compound | 中外制药株式会社 | 2024-09-24 | — | — | CN | claimed |
| US-20240038540-A1 | SURFACE TREATMENT COMPOSITION AND METHOD FOR PRODUCING WAFER | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-02-01 | — | — | US | claimed |
| EP-4299688-A1 | SURFACE TREATMENT COMPOSITION AND METHOD FOR PRODUCING WAFER | Central Glass Company, Limited (JP) | 2024-01-03 | — | — | EP | claimed |
| US-20080032062-A1 | Organometallic compounds having sterically hindered amides | PRAXAIR TECHNOLOGY, INC. | 2008-02-07 | — | — | US | claimed |
| US-6365643-B1 | Photoinitiators for cationic curing | TH. GOLDSCHMIDT AG (DE) | 2002-04-02 | — | — | US | claimed |
| US-6060617-A | REACTING AN ALKALI METAL HYDRIDE AND ALKALI METAL AMIDES WITH A SUBSTITUTED AMINE IN AN ETHER SOLVENT IN ABSENCE OF AN ELECTRON CARRIER TO PRODUCE AN ALKALI METAL AMIDE FREE OF ORGANIC CONTAMINANTS | FMC CORPORATION (US) | 2000-05-09 | — | — | US | claimed |
| EP-0843682-A1 | HIGH PURITY FORMULATIONS OF HIGHLY SUBSTITUTED LITHIUM AMIDE BASES | FMC CORPORATION (US) | 1998-05-27 | — | — | EP | claimed |
| US-5726308-A | High purity formulations of highly substituted lithium amide bases | FMC CORPORATION (US) | 1998-03-10 | — | — | US | claimed |
| WO-1997006173-A1 | HIGH PURITY FORMULATIONS OF HIGHLY SUBSTITUTED LITHIUM AMIDE BASES | FMC CORPORATION (US) | 1997-02-20 | — | — | WO | claimed |
| WO-1997002210-A2 | CONTAMINANT FREE ORGANOMETALLIC AMIDE COMPOSITIONS AND PROCESSES FOR MAKING SAME | FMC CORPORATION (US) | 1997-01-23 | — | — | WO | claimed |
| EP-0701984-A2 | Process for the preparation of alkaliamides | METALLGESELLSCHAFT AG (DE) | 1996-03-20 | — | — | EP | claimed |
| US-4203913-A | WITH AMMONIA, A PRIMARY AMINE, OR A TRIMETHYLSILYLAMINE | WACKER-CHEMIE GMBH (DE) | 1980-05-20 | — | — | US | claimed |
| US-3944545-A | Process for preparing desacetoxycephalosporins | ELI LILLY AND COMPANY (US) | 1976-03-16 | — | — | US | claimed |