Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LPAR3 | Q9UBY5 | 4/20 | 0.39 |
| ▸ | P2RY10 | O00398 | 5/20 | 0.36 |
| ▸ | GGPS1 | O95749 | 2/20 | 0.35 |
| ▸ | LPAR2 | Q9HBW0 | 3/20 | 0.34 |
| ▸ | LPAR1 | Q92633 | 2/20 | 0.34 |
| ▸ | GPR34 | Q9UPC5 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4794626 | 0.95 | P2RY10 (0.41) | LPAR3P2RY10GGPS1LPAR2LPAR1 | |
| SCHEMBL1872112 | 0.89 | LPAR3 (0.50) | LPAR3LPAR2LPAR1 | |
| SCHEMBL1138196 | 0.89 | P2RY10 (0.35) | P2RY10GGPS1GPR34 | |
| SCHEMBL1874948 | 0.84 | LPAR3 (0.51) | LPAR3LPAR2LPAR1 | |
| SCHEMBL27233119 | 0.83 | LPAR3 (0.54) | LPAR3LPAR2LPAR1 | |
| SCHEMBL1139630 | 0.81 | CYP3A4 (0.41) | LPAR3P2RY10LPAR2LPAR1GPR34 | |
| SCHEMBL3428266 | 0.81 | ALDH1A1 (0.42) | — | |
| SCHEMBL493110 | 0.81 | ALDH1A1 (0.42) | — | |
| SCHEMBL830452 | 0.79 | BTN3A1 (0.50) | GGPS1 | |
| SCHEMBL721089 | 0.78 | LPAR3 (0.41) | LPAR3LPAR2LPAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1201368-B1 | Polishing pad comprising a water-insoluble substance and method for producing thereof | JSR CORP (JP) | 2008-01-16 | — | — | EP | disclosed |
| US-20040224611-A1 | Polishing pad and method of polishing a semiconductor wafer | JSR CORPORATION (JP) | 2004-11-11 | — | — | US | disclosed |
| US-6645264-B2 | Crosslinkable elastomer with no carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups, and a water-insoluble substance with >1 carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups | JSR CORPORATION (JP) | 2003-11-11 | — | — | US | disclosed |
| US-20020078632-A1 | Composition for forming polishing pad, crosslinked body for polishing pad, polishing pad using the same and method for producing thereof | JSR CORPORATION (JP) | 2002-06-27 | — | — | US | disclosed |
| EP-1201368-A2 | Composition for forming polishing pad, crosslinked body for polishing pad, polishing pad using the same and method for producing thereof | JSR Corporation (JP) | 2002-05-02 | — | — | EP | disclosed |