Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.59 |
| ▸ | TSHR | P16473 | 7/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.40 |
| ▸ | BTN3A1 | O00481 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | APEX1 | P27695 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 2/20 | 0.34 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2638796 | 1.00 | THRB (0.59) | THRBTSHRALDH1A1BTN3A1POLB | |
| Ammonia Solution, Strong SCHEMBL18140209 | 0.98 | THRB (0.58) | THRBTSHRALDH1A1BTN3A1POLB | |
| Ammonia Solution, Strong SCHEMBL18141788 | 0.98 | THRB (0.58) | THRBTSHRALDH1A1BTN3A1POLB | |
| SCHEMBL31091982 | 0.94 | THRB (0.55) | THRBTSHRALDH1A1BTN3A1POLB | |
| SCHEMBL15194 | 0.94 | THRB (0.55) | THRBTSHRALDH1A1BTN3A1POLB | |
| Ammonia Solution, Strong SCHEMBL18140715 | 0.93 | THRB (0.53) | THRBTSHRALDH1A1BTN3A1POLB | |
| Phosphoric Acid SCHEMBL11307097 | 0.93 | THRB (0.53) | THRBTSHRALDH1A1BTN3A1POLB | |
| SCHEMBL6988091 | 0.92 | THRB (0.54) | THRBTSHRALDH1A1BTN3A1POLB | |
| SCHEMBL6833452 | 0.89 | THRB (0.50) | THRBTSHRALDH1A1BTN3A1POLB | |
| SCHEMBL6690732 | 0.89 | THRB (0.59) | THRBTSHRALDH1A1BTN3A1POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180163056-A1 | HYDROPHILIC CURABLE COMPOSITIONS | MITSUI CHEMICALS, INC. (JP) | 2018-06-14 | — | — | US | disclosed |
| US-20180036995-A1 | HYDROPHILIC MONOLAYER FILM WITH OPTICAL FUNCTIONALITY AND STACK OF THE SAME | MITSUI CHEMICALS, INC. (JP) | 2018-02-08 | — | — | US | disclosed |
| EP-3270192-A1 | HYDROPHILIC SINGLE-LAYER FILM HAVING OPTICAL FUNCTIONALITY, AND LAMINATE THEREOF | Mitsui Chemicals, Inc. (JP) | 2018-01-17 | — | — | EP | disclosed |
| EP-3081578-A1 | COMPOSITION FOR HYDROPHILIC CURED PRODUCT | Mitsui Chemicals, Inc. (JP) | 2016-10-19 | — | — | EP | disclosed |
| EP-1201368-B1 | Polishing pad comprising a water-insoluble substance and method for producing thereof | JSR CORP (JP) | 2008-01-16 | — | — | EP | disclosed |
| US-20040224611-A1 | Polishing pad and method of polishing a semiconductor wafer | JSR CORPORATION (JP) | 2004-11-11 | — | — | US | disclosed |
| US-6645264-B2 | Crosslinkable elastomer with no carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups, and a water-insoluble substance with >1 carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups | JSR CORPORATION (JP) | 2003-11-11 | — | — | US | disclosed |
| EP-0740214-B1 | Photosensitive composition and photosensitive rubber plate | ZEON CORP (JP) | 2002-07-10 | — | — | EP | disclosed |
| US-20020078632-A1 | Composition for forming polishing pad, crosslinked body for polishing pad, polishing pad using the same and method for producing thereof | JSR CORPORATION (JP) | 2002-06-27 | — | — | US | disclosed |
| EP-1201368-A2 | Composition for forming polishing pad, crosslinked body for polishing pad, polishing pad using the same and method for producing thereof | JSR Corporation (JP) | 2002-05-02 | — | — | EP | disclosed |
| EP-0699961-B1 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE RUBBER PLATE AND PROCESS FOR PRODUCING THE PLATE, AND FLEXOGRAPHIC PLATE AND PROCESS FOR PRODUCING THE PLATE | NIPPON ZEON CO (JP) | 2000-11-15 | — | — | EP | disclosed |
| US-5863704-A | BLENDS OF DIENE-AROMATIC VINYL COPOLYMER BLOCKS, PHOTOPOLYMERIZABLE ETHYLENICALLY UNSATURATED MONOMER AND PHOTOINITIATOR | NIPPON ZEON COMPANY, LTD. (JP) | 1999-01-26 | — | — | US | disclosed |
| US-5679485-A | CURABLE ELASTIC BLEND CONTAINING HYDROPHOBIC ADDITION POLYMER HAVING PENDANT HYDROPHILIC PHOSPHATE GROUPS; AQUEOUS DEVELOPMENT OF IMAGE | NIPPON ZEON CO., LTD. (JP) | 1997-10-21 | — | — | US | disclosed |
| EP-0751433-A2 | Release composition and photosensitive rubber plate with layer of the same | NIPPON ZEON CO., LTD. (JP) | 1997-01-02 | — | — | EP | disclosed |
| EP-0740214-A2 | Photosensitive composition and photosensitive rubber plate | NIPPON ZEON CO., LTD. (JP) | 1996-10-30 | — | — | EP | disclosed |
| EP-0699961-A1 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE RUBBER PLATE AND PROCESS FOR PRODUCING THE PLATE, AND FLEXOGRAPHIC PLATE AND PROCESS FOR PRODUCING THE PLATE | NIPPON ZEON CO., LTD. (JP) | 1996-03-06 | — | — | EP | disclosed |