SCHEMBL4802913

SCHEMBL4802913

OC1(OC2(O)CCCCC2)CCCCC1

nearest known ligand 0.36

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27443560 0.96 ALDH1A1 (0.32) ALDH1A1
SCHEMBL5879240 0.79 ALDH1A1 (0.36) ALDH1A1
SCHEMBL5879206 0.79 ALDH1A1 (0.36) ALDH1A1
SCHEMBL820197 0.79 ALDH1A1 (0.36) ALDH1A1
SCHEMBL6788720 0.79 ALDH1A1 (0.36) ALDH1A1
SCHEMBL5879103 0.79 ALDH1A1 (0.36) ALDH1A1
SCHEMBL5879214 0.79 ALDH1A1 (0.36) ALDH1A1
SCHEMBL5879304 0.79 ALDH1A1 (0.36) ALDH1A1
SCHEMBL5879083 0.79 ALDH1A1 (0.36) ALDH1A1
SCHEMBL5879198 0.79 ALDH1A1 (0.36) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108884245-B Polyimide film and method for producing same 柯尼卡美能达株式会社 2021-10-29 CN disclosed
CN-113287858-A Porous polymer polishing bristles and method for manufacturing the same JH罗得股份有限公司 2021-08-24 CN disclosed
US-20200205560-A1 POROUS POLYMERIC POLISHING BRISTLES AND METHODS FOR THEIR MANUFACTURE JH RHODES COMPANY, INC. 2020-07-02 US disclosed
US-9440326-B2 Non-planar glass polishing pad and method of manufacture JH RHODES COMPANY, INC. (US) 2016-09-13 US disclosed
US-9050697-B2 Self-conditioning polishing pad and a method of making the same JH RHODES COMPANY, INC. (US) 2015-06-09 US disclosed
US-20140024296-A1 NON-PLANAR GLASS POLISHING PAD AND METHOD OF MANUFACTURE JH RHODES COMPANY, INC. 2014-01-23 US disclosed
US-20130252519-A1 SELF-CONDITIONING POLISHING PAD AND A METHOD OF MAKING THE SAME JH RHODES COMPANY, INC. (US) 2013-09-26 US disclosed
WO-2013142134-A1 A SELF-CONDITIONING POLISHING PAD AND A METHOD OF MAKING THE SAME JH RHODES COMPANY, INC. (US) 2013-09-26 WO disclosed
WO-2012138705-A2 A SELF-CONDITIONING POLISHING PAD AND A METHOD OF MAKING THE SAME UNIVERSAL PHOTONICS, INC. (US) 2012-10-11 WO disclosed
US-20080146129-A1 Fast break-in polishing pad and a method of making the same KOUZUMA MAKOTO 2008-06-19 US disclosed
WO-1991000304-A1 MELT POLYMERIZATION PROCESS FOR MAKING POLYURETHANES THE DOW CHEMICAL COMPANY (US) 1991-01-10 WO disclosed