Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.62 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.62 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.52 |
| ▸ | MGLL | Q99685 | 3/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1045748 | 0.82 | TP53 (0.74) | TP53CYP3A4ALDH1A1MGLLTSHR | |
| SCHEMBL18428568 | 0.82 | TP53 (0.74) | TP53CYP3A4ALDH1A1MGLLTSHR | |
| SCHEMBL21493250 | 0.81 | TP53 (0.47) | TP53CYP3A4ALDH1A1MGLL | |
| SCHEMBL30398358 | 0.80 | TP53 (0.44) | TP53CYP3A4ALDH1A1MGLL | |
| SCHEMBL16429649 | 0.80 | TP53 (0.60) | TP53CYP3A4ALDH1A1MGLLTSHR | |
| SCHEMBL9347713 | 0.80 | TP53 (0.66) | TP53CYP3A4ALDH1A1MGLLTSHR | |
| SCHEMBL31688117 | 0.80 | TP53 (0.85) | TP53CYP3A4ALDH1A1MGLLTSHR | |
| SCHEMBL7656832 | 0.80 | TP53 (0.66) | TP53CYP3A4ALDH1A1MGLLTSHR | |
| SCHEMBL285188 | 0.80 | TP53 (0.66) | TP53CYP3A4ALDH1A1MGLLTSHR | |
| SCHEMBL7860984 | 0.80 | TP53 (0.66) | TP53CYP3A4ALDH1A1MGLLTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3475377-B1 | DISASSEMBLING METHOD | UNIV LIMERICK (IE) | 2026-05-06 | — | — | EP | disclosed |
| EP-3943564-B1 | ROOM TEMPERATURE STABLE, ELECTRICALLY CONDUCTIVE 1K EPOXY FORMULATION | HENKEL AG & CO KGAA (DE) | 2024-07-17 | — | — | EP | disclosed |
| US-20230331902-A1 | TWO COMPONENT (2K) EPOXY FORMULATION | HENKEL AG & CO KGAA (DE) | 2023-10-19 | — | — | US | disclosed |
| US-20230151252-A1 | ROOM TEMPERATURE STABLE, ELECTRICALLY CONDUCTIVE 1K EPOXY FORMULATION | HENKEL AG & CO KGAA (DE) | 2023-05-18 | — | — | US | disclosed |
| US-11649383-B2 | Adhesive composition | UNIVERSITY OF LIMERICK (IE) | 2023-05-16 | — | — | US | disclosed |
| WO-2022135997-A1 | TWO COMPONENT (2K) EPOXY FORMULATION | HENKEL AG & CO. KGAA (DE) | 2022-06-30 | — | — | WO | disclosed |
| EP-4015557-A1 | TWO COMPONENT (2K) EPOXY FORMULATION | Henkel AG & Co. KGaA (DE) | 2022-06-22 | — | — | EP | disclosed |
| WO-2022017815-A1 | ROOM TEMPERATURE STABLE, ELECTRICALLY CONDUCTIVE 1K EPOXY FORMULATION | HENKEL AG & CO. KGAA (DE) | 2022-01-27 | — | — | WO | disclosed |
| EP-3943564-A1 | ROOM TEMPERATURE STABLE, ELECTRICALLY CONDUCTIVE 1K EPOXY FORMULATION | Henkel AG & Co. KGaA (DE) | 2022-01-26 | — | — | EP | disclosed |
| US-7465531-B2 | Copolyalkylene oxide of optionally substituted alkyl 1,2-epoxypropionate and 9-anthracenylmethyl 2,3-epoxypropionate; between etching layer and photoresist to absorb exposure light in photolithography; prevents the occurrence of standing wave, undercutting and notching to obtain uniform pattern profile | DONGJIN SEMICHEM CO., LTD. (KR) | 2008-12-16 | — | — | US | disclosed |
| US-7309561-B2 | Polymer for forming anti-reflective coating layer | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-12-18 | — | — | US | disclosed |
| US-7309561-B2 | Polymer for forming anti-reflective coating layer | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-12-18 | — | — | US | disclosed |
| US-7309561-B2 | Polymer for forming anti-reflective coating layer | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-12-18 | — | — | US | disclosed |
| US-7282530-B2 | Polymer for forming anti-reflective coating layer | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-10-16 | — | — | US | disclosed |
| US-7282530-B2 | Polymer for forming anti-reflective coating layer | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-10-16 | — | — | US | disclosed |
| US-7282530-B2 | Polymer for forming anti-reflective coating layer | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-10-16 | — | — | US | disclosed |
| US-20060199106-A1 | Polymer for forming anti-reflective coating layer | DONGJIN SEMICHEM CO., LTD. | 2006-09-07 | — | — | US | disclosed |
| US-20060199108-A1 | Polymer for forming anti-reflective coating layer | DONGJIN SEMICHEM CO., LTD. | 2006-09-07 | — | — | US | disclosed |
| US-20060199107-A1 | Polymer for forming anti-reflective coating layer | DONGJIN SEMICHEM CO., LTD. | 2006-09-07 | — | — | US | disclosed |
| US-20060134558-A1 | Polymer for forming anti-reflective coating layer | DONGJIN SEMICHEM CO., LTD. | 2006-06-22 | — | — | US | disclosed |