SCHEMBL4808563

SCHEMBL4808563

CC(c1ccccc1)c1ccccc1.N=C=O.N=C=O.N=C=O.N=C=O.N=C=O

nearest known ligand 0.44

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
DAO P14920 1/20 0.41
MIF P14174 2/20 0.40
TYR P14679 1/20 0.39
TAAR1 Q96RJ0 3/20 0.39
ESR1 P03372 1/20 0.39
PDCD1 Q15116 1/20 0.39
ESR2 Q92731 1/20 0.39
CD274 Q9NZQ7 1/20 0.39
KMT2A Q03164 1/20 0.38
CYP2D6 P10635 2/20 0.38
ADRA2A P08913 1/20 0.38
ADRA2C P18825 1/20 0.38
LMNA P02545 1/20 0.38
HIF1A Q16665 1/20 0.38
KDM4E B2RXH2 1/20 0.38
SRC P12931 1/20 0.37
ALDH1A1 P00352 1/20 0.37
ALOX5 P09917 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL132503 1.00 DAO (0.41) DAOMIFTYRTAAR1ESR1
SCHEMBL3384898 1.00 DAO (0.41) DAOMIFTYRTAAR1ESR1
Benzene SCHEMBL28319276 0.98 KMT2A (0.41) DAOMIFTYRTAAR1ESR1
Water SCHEMBL11440439 0.98 DAO (0.40) DAOMIFTYRTAAR1ESR1
Isopropylbenzene SCHEMBL133881 0.85 CYP2C9 (0.41) MIFTYRTAAR1CYP2D6ADRA2A
Isopropylbenzene SCHEMBL1347599 0.85 CYP2C9 (0.41) MIFTYRTAAR1CYP2D6ADRA2A
SCHEMBL28845471 0.84 ACP3 (0.47) DAOTYR
SCHEMBL7499823 0.84 TAAR1 (0.50) TYRTAAR1ESR1PDCD1ESR2
SCHEMBL169730 0.84 TAAR1 (0.50) TYRTAAR1ESR1PDCD1ESR2
Benzene SCHEMBL28192760 0.84 TAAR1 (0.50) TYRTAAR1ESR1PDCD1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9440326-B2 Non-planar glass polishing pad and method of manufacture JH RHODES COMPANY, INC. (US) 2016-09-13 US disclosed
US-9050697-B2 Self-conditioning polishing pad and a method of making the same JH RHODES COMPANY, INC. (US) 2015-06-09 US disclosed
WO-2014018170-A1 NON-PLANAR GLASS POLISHING PAD AND METHOD OF MANUFACTURE JH RHODES COMPANY, INC. (US) 2014-01-30 WO disclosed
US-20140024296-A1 NON-PLANAR GLASS POLISHING PAD AND METHOD OF MANUFACTURE JH RHODES COMPANY, INC. 2014-01-23 US disclosed
WO-2013142134-A1 A SELF-CONDITIONING POLISHING PAD AND A METHOD OF MAKING THE SAME JH RHODES COMPANY, INC. (US) 2013-09-26 WO disclosed
US-20130252519-A1 SELF-CONDITIONING POLISHING PAD AND A METHOD OF MAKING THE SAME JH RHODES COMPANY, INC. (US) 2013-09-26 US disclosed
WO-2012138705-A2 A SELF-CONDITIONING POLISHING PAD AND A METHOD OF MAKING THE SAME UNIVERSAL PHOTONICS, INC. (US) 2012-10-11 WO disclosed
US-20080146129-A1 Fast break-in polishing pad and a method of making the same KOUZUMA MAKOTO 2008-06-19 US disclosed