SCHEMBL4809792

SCHEMBL4809792

CCCCC[Si](F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4808011 0.97 TSHR (0.50)
SCHEMBL9990841 0.97 TSHR (0.50)
SCHEMBL3412141 0.97 TSHR (0.50)
SCHEMBL31555165 0.97 TSHR (0.50)
SCHEMBL1681938 0.97 TSHR (0.50)
SCHEMBL28230210 0.97 TSHR (0.50)
SCHEMBL9990847 0.97 TSHR (0.50)
SCHEMBL626348 0.93
SCHEMBL15091662 0.91 TSHR (0.37)
Water SCHEMBL28260749 0.90

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108395590-A A kind of composite silicone rubber material applied widely 天长市荣盛有机硅科技有限公司 2018-08-14 CN claimed
US-7332446-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-02-19 US disclosed
CN-1542071-A Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device ��Խ��ѧ��ҵ��ʽ���� 2004-11-03 CN disclosed
US-20040188809-A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. 2004-09-30 US disclosed