SCHEMBL4810271

SCHEMBL4810271

CCO[Si](CCC1CCC2OC2C1)(OCC)C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4810041 0.93 PTGS1 (0.30)
SCHEMBL6423339 0.87
SCHEMBL4807500 0.85
SCHEMBL845272 0.82 PTGS1 (0.30)
SCHEMBL23061486 0.81 PTGS1 (0.32)
SCHEMBL20478203 0.81 PTGS1 (0.32)
SCHEMBL48916 0.81 PTGS1 (0.32)
SCHEMBL20658050 0.81 PTGS1 (0.32)
SCHEMBL286926 0.81 PTGS1 (0.32)
SCHEMBL611497 0.81 PTGS1 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117480273-A Primer composition for vapor deposition of inorganic oxide, cured product, and laminate DIC株式会社 2024-01-30 CN disclosed
WO-2023171514-A1 LAMINATE AND PACKAGING MATERIAL DIC株式会社 2023-09-14 WO disclosed
WO-2022264906-A1 PRIMER COMPOSITION FOR INORGANIC OXIDE VAPOR DEPOSITION, CURED PRODUCT AND MULTILAYER BODY DIC株式会社 2022-12-22 WO disclosed
WO-2020066993-A1 COMPOSITION, CURED OBJECT, LAMINATE, AND LIGHT RESISTANT COATING MATERIAL DIC株式会社 2020-04-02 WO disclosed
EP-3213915-B1 LAMINATE DAINIPPON INK & CHEMICALS (JP) 2019-08-14 EP disclosed
US-20170253965-A1 LAMINATE DIC CORPORATION (JP) 2017-09-07 US disclosed
EP-3213915-A1 LAMINATE DIC Corporation (JP) 2017-09-06 EP disclosed
CN-106104753-A The duplexer of oxygen plasma etch erosion resistant, etchant resist and use etchant resist DIC株式会社 2016-11-09 CN disclosed
CN-103392221-B Curing combination for nanometer stamping, nano impression formed body and pattern formation method DIC株式会社 2016-08-10 CN disclosed
US-20160137879-A1 INORGANIC FINE PARTICLE COMPOSITE BODY, METHOD FOR PRODUCING SAME, COMPOSITION AND CURED PRODUCT DIC CORPORATION (JP) 2016-05-19 US disclosed
CN-105339418-A Inorganic microparticle composite, method for producing same, composition, and cured product DAINIPPON INK &AMP 2016-02-17 CN disclosed
US-20140061970-A1 NANOIMPRINT CURABLE COMPOSITION, NANOIMPRINT-LITHOGRAPHIC MOLDED PRODUCT, AND METHOD FOR FORMING PATTERN DIC CORPORATION (JP) 2014-03-06 US disclosed
US-7435668-B2 Method for doping impurities, and for producing a semiconductor device and applied electronic apparatus using a solution containing impurity ions SONY CORPORATION (JP) 2008-10-14 US disclosed
US-7335539-B2 Method for making thin-film semiconductor device SONY CORPORATION (JP) 2008-02-26 US disclosed
US-20070298550-A1 Method for making thin-film semiconductor device SONY CORPORATION (JP) 2007-12-27 US disclosed
US-7273774-B2 Method for making thin-film semiconductor device SONY CORPORATION (JP) 2007-09-25 US disclosed
US-20060079033-A1 Method for making thin-film semiconductor device SONY CORPORATION (JP) 2006-04-13 US disclosed
US-6953754-B2 Functional device and method of manufacturing the same SONY CORPORATION (JP) 2005-10-11 US disclosed
US-20050181566-A1 Method for doping impurities, methods for producing semiconductor device and applied electronic apparatus SONY CORPORATION (JP) 2005-08-18 US disclosed
US-20040157470-A1 Functional device and production method therefor SONY CORPORATION (JP) 2004-08-12 US disclosed