Methacrylic Acid

Methacrylic Acid

SCHEMBL4815762

C=C(C)C(=O)O.O=C1NC(=O)C2CCC=CC12

nearest known ligand 0.33

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Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33
TSHR P16473 1/20 0.33
CASP1 P29466 1/20 0.33
BRCA1 P38398 1/20 0.33
CASP7 P55210 1/20 0.33
HBB P68871 1/20 0.33
HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Carbamic Acid SCHEMBL9839794 0.84 ALDH1A1 (0.30) ALDH1A1TSHRCASP1BRCA1CASP7
SCHEMBL4372283 0.84 HSD17B10 (0.31) HSD17B10
SCHEMBL2992065 0.84 BACE1 (0.33)
SCHEMBL2992061 0.84 BACE1 (0.33)
Acrylic Acid SCHEMBL4823826 0.84 GAA (0.30)
SCHEMBL2469139 0.82 BACE1 (0.32)
SCHEMBL31741298 0.82 BACE1 (0.32)
SCHEMBL2463994 0.82 BACE1 (0.32)
SCHEMBL2468842 0.82 BACE1 (0.32)
Propene SCHEMBL11784374 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7399574-B2 Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2008-07-15 US disclosed
US-20030118922-A1 Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2003-06-26 US disclosed