SCHEMBL4818403

SCHEMBL4818403

CCO[Si](OCC)(OCC)OCC.CO[Si](C)(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL810887 0.85
SCHEMBL27659138 0.83
SCHEMBL7188155 0.82
SCHEMBL1062613 0.81
SCHEMBL4022135 0.81
SCHEMBL312702 0.81
SCHEMBL5134167 0.81
SCHEMBL452809 0.80
SCHEMBL17680 0.80
SCHEMBL28318540 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024129435-A1 AMPHIPHILIC ABRASIVE PARTICLES AND THEIR USE FOR CHEMICAL MECHANICAL PLANARIZATION VERSUM MATERIALS US, LLC (US) 2024-06-20 WO disclosed
CN-111849387-A Basalt nano high-temperature sealant 武汉鼎邦环保科技有限公司 2020-10-30 CN disclosed
CN-109307994-A Toner for developing electrostatic image and use thereof 富士施乐株式会社 2019-02-05 CN disclosed
CN-109307993-A Toner for developing electrostatic image, electrostatic charge image developer and toner cartridge 富士施乐株式会社 2019-02-05 CN disclosed
CN-109307990-A Toner for developing electrostatic image, electrostatic charge image developer and toner cartridge 富士施乐株式会社 2019-02-05 CN disclosed
CN-109307992-A Toner for developing electrostatic image, electrostatic charge image developer and toner cartridge 富士施乐株式会社 2019-02-05 CN disclosed
CN-109307991-A Toner for developing electrostatic image and its application 富士施乐株式会社 2019-02-05 CN disclosed
CN-109307995-A Toner additive and its application, image forming apparatus and image forming method 富士施乐株式会社 2019-02-05 CN disclosed
EP-2518562-B1 A patterning process SHINETSU CHEMICAL CO (JP) 2019-01-16 EP disclosed
CN-108690384-A Actinic-radiation curable composition, cured coating film and laminated body DIC株式会社 2018-10-23 CN disclosed
EP-0246537-B1 NOTCH IMPACT-RESISTANT GRAFT POLYMERS BAYER AG (DE) 1991-12-18 EP disclosed
EP-0389905-A1 Elastomer modified poly(arylenesulfide) molding compositions BAYER AG (DE) 1990-10-03 EP disclosed
EP-0370347-A2 Ageing-resistant thermoplastic moulding mass with a high notch impact strength and surface quality BAYER AG (DE) 1990-05-30 EP disclosed
EP-0367013-A1 Moulding compositions based on polyester carbonate, polyalkylene terephthalate and grafted silicone rubber BAYER AG (DE) 1990-05-09 EP disclosed
EP-0338361-A2 Thermoplastic moulding compositions of aromatic polyether sulphones and grafted silicone rubbers BAYER AG (DE) 1989-10-25 EP disclosed
EP-0327806-A2 Impact-resistant polyamide moulding modified with a grafted silicone rubber BAYER AG (DE) 1989-08-16 EP disclosed
EP-0303078-A2 Moulding compositions from aromatic polyester and grafted silicone rubber BAYER AG (DE) 1989-02-15 EP disclosed
EP-0260559-A2 Non-aging thermoplastic moulding compositions with an enhanced degree of toughness at a low temperature BAYER AG (DE) 1988-03-23 EP disclosed
EP-0258746-A2 Grafted siloxane elastomers having a notch impact resistance BAYER AG (DE) 1988-03-09 EP disclosed
EP-0246537-A2 Notch impact-resistant graft polymers BAYER AG (DE) 1987-11-25 EP disclosed