SCHEMBL4822161

SCHEMBL4822161

C=CC(=O)c1ccc(OC(=O)/C=C/c2ccccc2)cc1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 6/20 0.68
CYP1B1 Q16678 8/20 0.57
MAOB P27338 4/20 0.57
MAPT P10636 4/20 0.57
MEN1 O00255 3/20 0.57
TNFRSF1A P19438 2/20 0.57
HSPD1 P10809 2/20 0.57
HSPE1 P61604 2/20 0.57
ALDH1A1 P00352 2/20 0.57
SMN1; SMN2 Q16637 1/20 0.54
MAOA P21397 2/20 0.54
AKT1 P31749 1/20 0.53
BCHE P06276 3/20 0.53
ACHE P22303 2/20 0.53
PLIN1 O60240 1/20 0.53
LMNA P02545 1/20 0.53
RECQL P46063 1/20 0.53
PLIN5 Q00G26 1/20 0.53
ABHD5 Q8WTS1 1/20 0.53
STS P08842 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4822165 1.00 KMT2A (0.68) KMT2ACYP1B1MAOBMAPTMEN1
SCHEMBL10867827 0.88 CYP1B1 (0.66) KMT2ACYP1B1MAOBMAPTMEN1
SCHEMBL5068764 0.87 KMT2A (0.71) KMT2ACYP1B1MAOBMAPTMEN1
SCHEMBL5068765 0.87 KMT2A (0.71) KMT2ACYP1B1MAOBMAPTMEN1
SCHEMBL16982630 0.85 KMT2A (0.83) KMT2ACYP1B1MAOBMAPTMEN1
SCHEMBL8756097 0.83 KMT2A (0.73) KMT2ACYP1B1MAOBMAPTMEN1
SCHEMBL8756092 0.83 KMT2A (0.73) KMT2ACYP1B1MAOBMAPTMEN1
SCHEMBL7543059 0.82 CYP3A4 (0.66) KMT2ACYP1B1MAOBMAPTMEN1
SCHEMBL8754249 0.82 KMT2A (0.78) KMT2ACYP1B1MAOBMAPTMEN1
SCHEMBL8754246 0.82 KMT2A (0.78) KMT2ACYP1B1MAOBMAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080213692-A1 RADIATION SENSITIVE COMPOSITION, MICROLENS, PROCESS FOR FORMING THE MICROLENS AND USE OF THE MICROLENS JSR CORPORATION (JP) 2008-09-04 US disclosed
US-7374799-B2 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens JSR CORPORATION (JP) 2008-05-20 US disclosed
US-20050157399-A1 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens JSR CORPORATION (JP) 2005-07-21 US disclosed
EP-1548497-A1 Radiation sensitive composition, microlens, process for forming the microlens and use of the microlens JSR Corporation (JP) 2005-06-29 EP disclosed