Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CCNB2 | O95067 | 1/20 | 0.66 |
| ▸ | CDK1 | P06493 | 1/20 | 0.66 |
| ▸ | CDK4 | P11802 | 1/20 | 0.66 |
| ▸ | CCNB1 | P14635 | 1/20 | 0.66 |
| ▸ | CCND1 | P24385 | 1/20 | 0.66 |
| ▸ | CCNB3 | Q8WWL7 | 1/20 | 0.66 |
| ▸ | APP | P05067 | 4/20 | 0.64 |
| ▸ | LCK | P06239 | 3/20 | 0.61 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.54 |
| ▸ | MAPT | P10636 | 3/20 | 0.54 |
| ▸ | CA12 | O43570 | 2/20 | 0.54 |
| ▸ | CA1 | P00915 | 2/20 | 0.54 |
| ▸ | CA2 | P00918 | 2/20 | 0.54 |
| ▸ | CA3 | P07451 | 2/20 | 0.54 |
| ▸ | CA4 | P22748 | 2/20 | 0.54 |
| ▸ | CA6 | P23280 | 2/20 | 0.54 |
| ▸ | CA5A | P35218 | 2/20 | 0.54 |
| ▸ | CA7 | P43166 | 2/20 | 0.54 |
| ▸ | CA9 | Q16790 | 2/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| (E)-3,4'-Stilbendiol SCHEMBL720092 | 0.91 | LCK (0.72) | CCNB2CDK1CDK4CCNB1CCND1 | |
| (E)-3,4'-Stilbendiol SCHEMBL29798835 | 0.91 | LCK (0.72) | CCNB2CDK1CDK4CCNB1CCND1 | |
| (E)-3,4'-Stilbendiol SCHEMBL720093 | 0.91 | LCK (0.72) | CCNB2CDK1CDK4CCNB1CCND1 | |
| (E)-3,4'-Stilbendiol SCHEMBL4167479 | 0.91 | LCK (0.72) | CCNB2CDK1CDK4CCNB1CCND1 | |
| SCHEMBL11033125 | 0.91 | CCNB2 (0.76) | CCNB2CDK1CDK4CCNB1CCND1 | |
| SCHEMBL13359845 | 0.82 | APP (0.76) | APPKDM4EALDH1A1MAPTCA12 | |
| SCHEMBL303940 | 0.82 | APP (0.76) | APPKDM4EALDH1A1MAPTCA12 | |
| SCHEMBL2631908 | 0.82 | APP (0.76) | APPKDM4EALDH1A1MAPTCA12 | |
| SCHEMBL1931278 | 0.82 | APP (0.73) | APPLCKKDM4EALDH1A1MAPT | |
| SCHEMBL13338339 | 0.82 | LCK (0.86) | CCNB2CDK1CDK4CCNB1CCND1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 103 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2105794-B1 | Novel photoacid generator, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-19 | — | — | EP | disclosed |
| EP-2000851-B1 | Photomask blank, resist pattern forming process, and photomask preparation process | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| EP-2033966-B1 | Novel photoacid generators, resist compositons, and patterning processes | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| EP-1099983-B1 | Chemically amplified positive resist composition and patterning method | SHINETSU CHEMICAL CO (JP) | 2014-08-06 | — | — | EP | disclosed |
| US-8609889-B2 | Photoacid generator, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-12-17 | — | — | US | disclosed |
| US-8541158-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-09-24 | — | — | US | disclosed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | disclosed |
| US-8394570-B2 | Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-12 | — | — | US | disclosed |
| US-8343694-B2 | Photomask blank, resist pattern forming process, and photomask preparation process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-01 | — | — | US | disclosed |
| US-8283104-B2 | Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-09 | — | — | US | disclosed |
| US-6440634-B1 | MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-08-27 | — | — | US | disclosed |
| US-6416928-B1 | HALOGENONIUM OR SULFONIUM SALTS OF SULFONATED DIPHENYLALKANE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-07-09 | — | — | US | disclosed |
| US-20020076643-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-06-20 | — | — | US | disclosed |
| US-20020077493-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-06-20 | — | — | US | disclosed |
| US-6395446-B1 | CONTAINING SULFONYLDIAZOMETHANE COMPOUND AS ACID GENERATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-28 | — | — | US | disclosed |
| US-6338931-B1 | PHOTOACID GENERATOR OF SULFONYLDIAZOMETHANE COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-15 | — | — | US | disclosed |
| US-20010035394-A1 | Chemically amplified positive resist composition and patterning method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-11-01 | — | — | US | disclosed |
| EP-1136885-A1 | Chemically amplified positive resist composition and patterning method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-09-26 | — | — | EP | disclosed |
| EP-1099983-A1 | Chemically amplified positive resist composition and patterning method | Shin-Etsu Chemical Co., Ltd. (JP) | 2001-05-16 | — | — | EP | disclosed |
| EP-1077391-A1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-02-21 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020077493-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | ABL1, PI4K2B, FES | CCNB2 1210/4885CDK1 1353/4885CDK4 558/4885 |
| US-20020076643-A1 | Novel onium salts, photoacid generators, resist compositions, and patterning process | PNN, PI4K2B, PI4K2A | CCNB2 1424/4885CDK1 1572/4885CDK4 735/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.