Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APP | P05067 | 4/20 | 0.76 |
| ▸ | MAOB | P27338 | 4/20 | 0.70 |
| ▸ | MAPT | P10636 | 4/20 | 0.60 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.60 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.60 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.53 |
| ▸ | PKM | P14618 | 3/20 | 0.53 |
| ▸ | MEN1 | O00255 | 3/20 | 0.53 |
| ▸ | HSPD1 | P10809 | 2/20 | 0.53 |
| ▸ | HSPE1 | P61604 | 2/20 | 0.53 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.53 |
| ▸ | RAB9A | P51151 | 2/20 | 0.53 |
| ▸ | NFKB2 | Q00653 | 2/20 | 0.53 |
| ▸ | RELA | Q04206 | 2/20 | 0.53 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.53 |
| ▸ | MAOA | P21397 | 2/20 | 0.53 |
| ▸ | CYP1B1 | Q16678 | 2/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.53 |
| ▸ | ALDH2 | P05091 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2631908 | 1.00 | APP (0.76) | APPMAOBMAPTALDH1A1KDM4E | |
| SCHEMBL13359845 | 1.00 | APP (0.76) | APPMAOBMAPTALDH1A1KDM4E | |
| Phenol SCHEMBL1743773 | 0.92 | MAOB (0.74) | APPMAOBMAPTALDH1A1KDM4E | |
| (E)-4-Styrylphenol SCHEMBL716721 | 0.90 | APP (0.61) | APPMAOBMAPTALDH1A1KDM4E | |
| (E)-4-Styrylphenol SCHEMBL27993 | 0.90 | APP (0.61) | APPMAOBMAPTALDH1A1KDM4E | |
| SCHEMBL14038171 | 0.90 | APP (0.61) | APPMAOBMAPTALDH1A1KDM4E | |
| SCHEMBL11439096 | 0.89 | APP (0.94) | APPMAOBMAPTALDH1A1KDM4E | |
| 4-Vinylphenol SCHEMBL28701079 | 0.89 | APP (0.61) | APPMAOBMAPTALDH1A1KDM4E | |
| SCHEMBL5179114 | 0.89 | APP (0.94) | APPMAOBMAPTALDH1A1KDM4E | |
| SCHEMBL11498215 | 0.89 | APP (0.60) | APPMAOBMAPTALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 197 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110117404-B | Resin composition, and prepreg, metal foil laminate and printed wiring board produced using the same | 台燿科技股份有限公司 | 2021-12-07 | — | — | CN | claimed |
| CN-109053944-B | Polymer resin and application thereof in high-frequency circuit board | 广东生益科技股份有限公司 | 2020-03-17 | — | — | CN | claimed |
| JP-6032838-A | — | — | None | — | — | JP | disclosed |
| CN-117724293-A | KrF negative photoresist, preparation method thereof and patterning method | 北京科华微电子材料有限公司 | 2024-03-19 | — | — | CN | disclosed |
| US-11550221-B2 | Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and nitrogen-containing aromatic heterocyclic compound | TOKYO OHKA KOG YO CO., LTD. (JP) | 2023-01-10 | — | — | US | disclosed |
| CN-110117404-B | Resin composition, and prepreg, metal foil laminate and printed wiring board produced using the same | 台燿科技股份有限公司 | 2021-12-07 | — | — | CN | disclosed |
| US-11061326-B2 | Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-07-13 | — | — | US | disclosed |
| CN-108976706-B | Epoxy resin composition, and prepreg and laminated board using same | 广东生益科技股份有限公司 | 2021-06-04 | — | — | CN | disclosed |
| US-11022880-B2 | Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-06-01 | — | — | US | disclosed |
| CN-109082021-B | Polymer resin composition and application thereof in high-frequency circuit board | 广东生益科技股份有限公司 | 2021-01-01 | — | — | CN | disclosed |
| CN-107797384-B | Photosensitive resin, positive photoresist and application | 上海飞凯电子材料有限公司 | 2020-10-09 | — | — | CN | disclosed |
| US-5376498-A | Blend of an alkali-soluble resin, compound that generates an acid upon irradiation, functional aromatic compound and a phenolic compound | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-12-27 | — | — | US | disclosed |
| US-5302662-A | Polyamides, polyethers, polystyrene, polycarbonates, and polymethyl vinyl ether and compatibilizer comprising styrene-vinylphenol copolymer; mechanical properties | EASTMAN KODAK COMPANY (US) | 1994-04-12 | — | — | US | disclosed |
| JP-H0632838-A | P-HYDROXYSTYRENE-STYRENE RANDOM COPOLYNMER PARTIALLY ESTERIFIED WITH T-BUTOXYCARBONYL GROUP AND ITS PRODUCTION | SHIN ETSU CHEM CO LTD | 1994-02-08 | — | — | JP | disclosed |
| US-5276089-A | Polystyrene, polyphenylene oxide blends with polyesters | EASTMAN KODAK COMPANY (US) | 1994-01-04 | — | — | US | disclosed |
| EP-0542572-A1 | Negative type radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-05-19 | — | — | EP | disclosed |
| EP-0294109-B1 | DYESHEETS | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1993-03-10 | — | — | EP | disclosed |
| EP-0530648-A2 | Compatible polyester blends | EASTMAN CHEMICAL COMPANY (US) | 1993-03-10 | — | — | EP | disclosed |
| US-4920092-A | POLYMER BACKBONE BONDED TO A STRUCTURE OF THERMALLY TRANSFER-ABLE DYE MOLECULES | IMPERIAL CHEMICAL INDUSTRICES PLC (GB) | 1990-04-24 | — | — | US | disclosed |
| EP-0294109-A2 | Dyesheets | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1988-12-07 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11022880-B2 | Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound | CUTA, POLR1C, ASIC1 | APP 1442/4885MAOB 1447/4885MAPT 1711/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.