Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 7/20 | 0.46 |
| ▸ | CA7 | P43166 | 7/20 | 0.46 |
| ▸ | CA9 | Q16790 | 7/20 | 0.46 |
| ▸ | CA14 | Q9ULX7 | 7/20 | 0.46 |
| ▸ | CA1 | P00915 | 6/20 | 0.46 |
| ▸ | CA2 | P00918 | 5/20 | 0.46 |
| ▸ | TYR | P14679 | 3/20 | 0.42 |
| ▸ | AKR1B10 | O60218 | 4/20 | 0.42 |
| ▸ | AKR1B1 | P15121 | 4/20 | 0.42 |
| ▸ | MAOB | P27338 | 2/20 | 0.42 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.42 |
| ▸ | GLO1 | Q04760 | 1/20 | 0.42 |
| ▸ | CAMK2A | Q9UQM7 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | RECQL | P46063 | 1/20 | 0.41 |
| ▸ | MMP2 | P08253 | 1/20 | 0.41 |
| ▸ | MMP9 | P14780 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27713740 | 0.86 | CACNA1B (0.46) | MAOBPTGS2ALDH1A1MAPTSMN1; SMN2 | |
| SCHEMBL3468078 | 0.86 | CACNA1B (0.50) | ALDH1A1MAPTSMN1; SMN2TDP1RECQL | |
| SCHEMBL75625 | 0.86 | CACNA1B (0.50) | ALDH1A1MAPTSMN1; SMN2TDP1RECQL | |
| SCHEMBL75626 | 0.86 | CACNA1B (0.50) | ALDH1A1MAPTSMN1; SMN2TDP1RECQL | |
| SCHEMBL8069940 | 0.85 | CA12 (0.40) | CA12CA7CA9CA14CA1 | |
| SCHEMBL28770857 | 0.85 | GSK3B (0.50) | ALDH1A1MAPTTDP1CYP2C9F3 | |
| SCHEMBL27733957 | 0.84 | CACNA1B (0.38) | ALDH1A1MAPTSMN1; SMN2TDP1RECQL | |
| SCHEMBL7368086 | 0.83 | CA12 (0.51) | CA12CA7CA9CA14CA1 | |
| SCHEMBL7368082 | 0.83 | CA12 (0.51) | CA12CA7CA9CA14CA1 | |
| SCHEMBL7368088 | 0.83 | CA12 (0.51) | CA12CA7CA9CA14CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2105794-B1 | Novel photoacid generator, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-19 | — | — | EP | disclosed |
| EP-2000851-B1 | Photomask blank, resist pattern forming process, and photomask preparation process | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| EP-2033966-B1 | Novel photoacid generators, resist compositons, and patterning processes | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| EP-1099983-B1 | Chemically amplified positive resist composition and patterning method | SHINETSU CHEMICAL CO (JP) | 2014-08-06 | — | — | EP | disclosed |
| US-8609889-B2 | Photoacid generator, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-12-17 | — | — | US | disclosed |
| US-8541158-B2 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-09-24 | — | — | US | disclosed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | disclosed |
| US-8394570-B2 | Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-12 | — | — | US | disclosed |
| US-8343694-B2 | Photomask blank, resist pattern forming process, and photomask preparation process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-01 | — | — | US | disclosed |
| US-8268531-B2 | Photoacid generator compounds and compositions | CORNELL RESEARCH FOUNDATION, INC. (US) | 2012-09-18 | — | — | US | disclosed |
| US-6156477-A | Polymers and chemically amplified positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-12-05 | — | — | US | disclosed |
| EP-0466359-B1 | Process for making low optical density polymers and copolymers for photoresists and optical applications | HOECHST CELANESE CORP (US) | 2000-05-10 | — | — | EP | disclosed |
| EP-0978015-A1 | LIGHT ABSORBING POLYMERS | Clariant International Ltd. (CH) | 2000-02-09 | — | — | EP | disclosed |
| US-5981145-A | CONTAINING A COPOLYMER OF MODIFIED HYDROXYSTYRENE MONOMER AND AN ETHYLENICALLY UNSATURATED MONOMER FREE OF AROMATIC RING, SUITABLE FOR ANTIREFLECTIVE COATING | CLARIANT FINANCE (BVI) LIMITED (VG) | 1999-11-09 | — | — | US | disclosed |
| WO-1998049602-A1 | LIGHT ABSORBING POLYMERS | CLARIANT INTERNATIONAL, LTD. (CH) | 1998-11-05 | — | — | WO | disclosed |
| US-5625007-A | POLYHYDROXYSTYRENE POLYMERS FROM TRANSESTERIFICATION OF P-ACETOXYSTYRENE POLYMERS | HOECHST CELANESE CORP. (US) | 1997-04-29 | — | — | US | disclosed |
| US-5350660-A | Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1994-09-27 | — | — | US | disclosed |
| US-5239015-A | Polymerization of 4-acetoxystyrene in presence of alcohol; transesterification | HOECHST CELANESE CORPORATION (US) | 1993-08-24 | — | — | US | disclosed |
| EP-0466359-A2 | Process for making low optical density polymers and copolymers for photoresists and optical applications | HOECHST CELANESE CORPORATION (US) | 1992-01-15 | — | — | EP | disclosed |
| EP-0440374-A2 | Chemical amplified resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1991-08-07 | — | — | EP | disclosed |