SCHEMBL4824717

SCHEMBL4824717

COc1cccc(C2(c3cccc(OC)c3O)c3ccccc3-c3ccccc32)c1O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TP53 P04637 2/20 0.52
ALDH1A1 P00352 2/20 0.52
KDM4E B2RXH2 2/20 0.52
MAPT P10636 2/20 0.52
LMNA P02545 1/20 0.52
CYP3A4 P08684 1/20 0.52
HPGD P15428 1/20 0.52
ALOX15 P16050 1/20 0.52
ALOX12 P18054 1/20 0.52
MAPK1 P28482 1/20 0.52
HSD17B10 Q99714 1/20 0.52
PDK2 Q15119 2/20 0.46
CA1 P00915 3/20 0.44
CA2 P00918 3/20 0.44
TSHR P16473 1/20 0.44
MEN1 O00255 3/20 0.43
KMT2A Q03164 3/20 0.43
NPC1 O15118 2/20 0.43
RAB9A P51151 2/20 0.43
TLR2 O60603 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14191206 0.83 CA1 (0.50) TP53ALDH1A1KDM4EMAPTLMNA
SCHEMBL2783173 0.81 PDK2 (0.50) ALDH1A1MAPTHPGDMAPK1PDK2
SCHEMBL30749099 0.80 PDK2 (0.59) ALDH1A1KDM4EMAPTLMNAHPGD
SCHEMBL995102 0.79 CA1 (0.46) TP53ALDH1A1KDM4EMAPTLMNA
SCHEMBL8004728 0.76 KDM4E (0.70) TP53ALDH1A1KDM4EMAPTLMNA
SCHEMBL3420224 0.76 MAOB (0.47) TP53ALDH1A1KDM4EMAPTLMNA
SCHEMBL17427508 0.75 CA1 (0.41) TP53ALDH1A1CYP3A4HPGDPDK2
SCHEMBL4792150 0.75 ALDH1A1 (0.46) TP53ALDH1A1KDM4EMAPTLMNA
SCHEMBL31536724 0.75 ALDH1A1 (0.61) TP53ALDH1A1KDM4EMAPTLMNA
SCHEMBL29616923 0.75 ALDH1A1 (0.46) TP53ALDH1A1KDM4EMAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374862-B2 Photosensitive resin composition and curing product thereof NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2008-05-20 US disclosed
US-20060102051-A1 Photosensitive resin composition and curing product thereof NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2006-05-18 US disclosed
EP-1600812-A1 PHOTOSENSITIVE RESIN COMPOSITION AND CURING PRODUCT THEREOF Nippon Kayaku Kabushiki Kaisha (JP) 2005-11-30 EP disclosed