⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13836864 | 0.75 | — | — | |
| SCHEMBL6761679 | 0.71 | — | — | |
| SCHEMBL7691561 | 0.67 | — | — | |
| SCHEMBL28640924 | 0.65 | — | — | |
| SCHEMBL399399 | 0.63 | — | — | |
| SCHEMBL2189344 | 0.61 | — | — | |
| SCHEMBL410162 | 0.61 | — | — | |
| SCHEMBL18841288 | 0.59 | — | — | |
| SCHEMBL16481141 | 0.59 | — | — | |
| SCHEMBL24091416 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 194 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-100507716-C | Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device | TOYKO OHKA KOGYO CO LTD (JP) | 2009-07-01 | — | — | CN | claimed |
| CN-1311298-C | Photoresist composition, laminated material, pattern forming method and method for manufacturing semiconductor device | TOKYO OHKA KOGYO CO LTD (JP) | 2007-04-18 | — | — | CN | claimed |
| CN-1740911-A | Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device | TOYKO OHKA KOGYO CO LTD (JP) | 2006-03-01 | — | — | CN | claimed |
| CN-1520534-A | Photoresist composition, laminated material, pattern forming method and method for manufacturing semiconductor device | ͬ�Ϳ�ҵ��ʽ���� | 2004-08-11 | — | — | CN | claimed |
| US-20250216783-A1 | ANTI-SPACER MASKING PROCESS USING SECOND SWITCHABLE POLYMER | TOKYO ELECTRON LTD (JP) | 2025-07-03 | — | — | US | disclosed |
| CN-104281006-B | Radiation-ray sensitive composition | 三菱瓦斯化学株式会社 | 2019-01-22 | — | — | CN | disclosed |
| CN-102902157-B | Glass processing method | 东京应化工业株式会社 | 2018-07-27 | — | — | CN | disclosed |
| CN-108008600-A | Radiation-ray sensitive composition | 三菱瓦斯化学株式会社 | 2018-05-08 | — | — | CN | disclosed |
| CN-107949808-A | Lower layer film for lithography forms material, lower layer film for lithography is formed with composition, lower layer film for lithography and its manufacture method, pattern formation method, resin and purification process | 三菱瓦斯化学株式会社 | 2018-04-20 | — | — | CN | disclosed |
| CN-107924123-A | Photoetching material and its manufacture method, photoetching composition, pattern formation method and, compound, resin and their purification process | 学校法人关西大学 | 2018-04-17 | — | — | CN | disclosed |
| CN-107924131-A | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, method for producing same, and method for forming resist pattern | 三菱瓦斯化学株式会社 | 2018-04-17 | — | — | CN | disclosed |
| CN-104981463-B | Compound, lower layer film for lithography form material, lower layer film for lithography and pattern formation method | 三菱瓦斯化学株式会社 | 2018-04-13 | — | — | CN | disclosed |
| CN-1263611-A | Method for forming pattern | CLARIANT INT LTD (CH) | 2000-08-16 | — | — | CN | disclosed |
| CN-1263612-A | Chemically amplified resist composition | CLARIANT INT LTD (CH) | 2000-08-16 | — | — | CN | disclosed |
| CN-1239556-A | Novel process for preparing resists | CLARIANT INT LTD (CH) | 1999-12-22 | — | — | CN | disclosed |
| CN-1229480-A | Radiation-sensitive resist composition with high heat resistance | CLARIANT INT LTD (CH) | 1999-09-22 | — | — | CN | disclosed |
| CN-1191993-A | Radiation sensitive composition adapted for roller coating | CLARIANT INT LTD (CH) | 1998-09-02 | — | — | CN | disclosed |
| CN-1191992-A | Radiation-sensitive composition adapted for roller coating | CLARIANT INT LTD (CH) | 1998-09-02 | — | — | CN | disclosed |
| CN-1180849-A | Radiation sensitve composition | CLARIANT INT LTD (CH) | 1998-05-06 | — | — | CN | disclosed |
| CN-1159459-A | Polymer composition and resist meterial | WAKO PURE CHEM IND LTD (JP) | 1997-09-17 | — | — | CN | disclosed |