⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15856915 | 0.82 | EPHX1 (0.32) | — | |
| SCHEMBL8571779 | 0.81 | EPHX1 (0.31) | — | |
| SCHEMBL44322 | 0.79 | — | — | |
| SCHEMBL233460 | 0.79 | EPHX1 (0.30) | — | |
| SCHEMBL5943652 | 0.78 | NPC1 (0.31) | — | |
| SCHEMBL16659345 | 0.77 | KDM4E (0.33) | — | |
| SCHEMBL1993294 | 0.77 | — | — | |
| SCHEMBL4383381 | 0.76 | EPHX1 (0.33) | — | |
| SCHEMBL17219539 | 0.76 | EPHX1 (0.30) | — | |
| SCHEMBL1993292 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108572514-B | Photosensitive resin composition, cured product, substrate, and article | 日本化药株式会社 | 2022-08-23 | — | — | CN | disclosed |
| US-7374862-B2 | Photosensitive resin composition and curing product thereof | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20060102051-A1 | Photosensitive resin composition and curing product thereof | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2006-05-18 | — | — | US | disclosed |
| EP-1600812-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND CURING PRODUCT THEREOF | Nippon Kayaku Kabushiki Kaisha (JP) | 2005-11-30 | — | — | EP | disclosed |