Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGAT1 | O75907 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17281573 | 0.79 | DGAT1 (0.39) | DGAT1ALDH1A1GAA | |
| SCHEMBL25768043 | 0.77 | GAA (0.38) | ALDH1A1GAA | |
| SCHEMBL23998526 | 0.77 | GAA (0.38) | ALDH1A1GAA | |
| SCHEMBL6348804 | 0.76 | GAA (0.37) | GAA | |
| SCHEMBL6348809 | 0.76 | GAA (0.37) | GAA | |
| SCHEMBL23998492 | 0.76 | GAA (0.37) | GAA | |
| SCHEMBL7805815 | 0.74 | GAA (0.35) | GAA | |
| SCHEMBL11841794 | 0.72 | DGAT1 (0.46) | DGAT1ALDH1A1GAA | |
| SCHEMBL1661821 | 0.72 | DGAT1 (0.46) | DGAT1ALDH1A1GAA | |
| SCHEMBL4677120 | 0.72 | DGAT1 (0.46) | DGAT1ALDH1A1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7358027-B2 | Used to generate resist images on a substrate, i.e., in the manufacture of integrated circuits | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-04-15 | — | — | US | disclosed |
| US-6730452-B2 | TO GENERATE RESIST IMAGES ON A SUBSTRATE IN THE MANUFACTURE OF INTEGRATED CIRCUITS | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-05-04 | — | — | US | disclosed |
| US-20030186160-A1 | Used to generate resist images on a substrate, i.e., in the manufacture of integrated circuits | GLOBALFOUNDRIES U.S. INC. | 2003-10-02 | — | — | US | disclosed |
| US-6610456-B2 | Such as 4-(hexafluorohydroxyisopropyl)styrene copolymer with tert-butyl alpha-trifluoromethyl acrylate; transparent to deep ultraviolet (DUV) radiation | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-08-26 | — | — | US | disclosed |
| US-6548219-B2 | Transparent to deep ultraviolet (DUV) radiation | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-04-15 | — | — | US | disclosed |
| US-6509134-B2 | Used to generate resist images; in the manufacture of integrated circuits | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-01-21 | — | — | US | disclosed |
| US-20020164538-A1 | Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-11-07 | — | — | US | disclosed |
| US-20020146638-A1 | Norbornene fluoroacrylate copolymers and process for use thereof | GLOBALFOUNDRIES U.S. INC. | 2002-10-10 | — | — | US | disclosed |
| US-20020146639-A1 | Lithographic photoresist composition and process for its use | GLOBALFOUNDRIES U.S. INC. | 2002-10-10 | — | — | US | disclosed |
| US-20020102490-A1 | Substituted norbornene fluoroacrylate copolymers and use thereof lithographic photoresist compositions | GLOBALFOUNDRIES U.S. INC. | 2002-08-01 | — | — | US | disclosed |