SCHEMBL4830545

SCHEMBL4830545

CCC(C=C(C)C(N)=O)N(C(C)C)C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3278035 0.83
SCHEMBL1135132 0.83 KDM4E (0.30)
SCHEMBL736603 0.83 KDM4E (0.30)
Hydrochloric Acid SCHEMBL10636938 0.81
SCHEMBL7290715 0.81 TDP1 (0.31)
SCHEMBL33997 0.81 TDP1 (0.31)
SCHEMBL9465805 0.80 FDPS (0.33)
Bromide SCHEMBL3232025 0.79 TDP1 (0.31)
Hydrochloric Acid SCHEMBL153917 0.79 TDP1 (0.31)
SCHEMBL4787328 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0123140-B1 BINDER FOR CATIONICALLY ELECTRODEPOSITABLE COATING BASF Lacke + Farben AG (DE) 1986-07-23 EP claimed
US-7407706-B2 Encapsulated matter comprising multiple polymeric coatings of opposite charges and production process thereof SEIKO EPSON CORPORATION (JP) 2008-08-05 US disclosed
US-20060222851-A1 Encapsulated matter and production process thereof SEIKO EPSON CORPORATION 2006-10-05 US disclosed