⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4836621 | 1.00 | — | — | |
| SCHEMBL1322409 | 1.00 | — | — | |
| SCHEMBL4838016 | 1.00 | — | — | |
| SCHEMBL4833880 | 1.00 | — | — | |
| SCHEMBL4830633 | 1.00 | — | — | |
| SCHEMBL3564481 | 1.00 | — | — | |
| SCHEMBL4837543 | 1.00 | — | — | |
| SCHEMBL4833922 | 1.00 | — | — | |
| SCHEMBL2569586 | 0.97 | — | — | |
| SCHEMBL726154 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9416318-B2 | Liquid crystal composition, polymer, film, and cholesteric liquid crystal | FUJIFILM CORPORATION (JP) | 2016-08-16 | — | — | US | disclosed |
| CN-104871046-A | Multilayered cholesteric liquid crystal, process for producing same, and laminate of multilayered cholesteric liquid crystal | FUJIFILM CORP | 2015-08-26 | — | — | CN | disclosed |
| US-20150152332-A1 | LIQUID CRYSTAL COMPOSITION, POLYMER, FILM, AND CHOLESTERIC LIQUID CRYSTAL | FUJIFILM CORPORATION (JP) | 2015-06-04 | — | — | US | disclosed |
| CN-1808273-B | Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG ELECTRONICS CO LTD | 2012-12-26 | — | — | CN | disclosed |
| US-7338737-B2 | Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-03-04 | — | — | US | disclosed |
| US-7297452-B2 | Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-11-20 | — | — | US | disclosed |
| US-20070254221-A1 | Akali-soluble resin, quinone diazide, surfactant mixture of a 3-perfluoroalkylpropane epoxide and polyethersilicones), and a solvent; high-quality display panels with uniformly-coated insulating layers. | SAMSUNG DISPLAY CO., LTD. (KR) | 2007-11-01 | — | — | US | disclosed |
| CN-1808273-A | Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG ELECTRONICS CO LTD (KR) | 2006-07-26 | — | — | CN | disclosed |
| US-20060141393-A1 | Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone | SAMSUNG ELECTRONICS CO., LTD. | 2006-06-29 | — | — | US | disclosed |
| US-20060131267-A1 | Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG DISPLAY CO., LTD. (KR) | 2006-06-22 | — | — | US | disclosed |