SCHEMBL4843471

SCHEMBL4843471

[GeH2-].[GeH2-].[GeH2-].[In+3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29357481 0.71
SCHEMBL5331166 0.71
Methane SCHEMBL29126860 0.71
SCHEMBL4954543 0.71
SCHEMBL13684522 0.50
SCHEMBL569299 0.50
Hydrochloric Acid SCHEMBL1180859 0.50
SCHEMBL18978973 0.50
Fluoride Ion SCHEMBL5792291 0.50
Iodide SCHEMBL19755 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-RE39977-E1 Near infrared chemical imaging microscope CHEMIMAGE CORPORATION (US) 2008-01-01 US claimed
US-20040159789-A1 Near infrared chemical imaging microscope CHEMIMAGE TECHNOLOGIES LLC 2004-08-19 US claimed
US-6734962-B2 Near infrared chemical imaging microscope CHEMIMAGE CORPORATION 2004-05-11 US claimed
US-20020113210-A1 Near infrared chemical imaging microscope CHEMIMAGE CORPORATION 2002-08-22 US claimed
US-7276187-B2 Transparent conductive thin film, process for producing the same, sintered target for producing the same, and transparent, electroconductive substrate for display panel, and organic electroluminiscence device SUMITOMO METAL MINING CO., LTD. (JP) 2007-10-02 US disclosed
US-7276186-B2 Transparent conductive thin film, process for producing the same, sintered target for producing the same, and transparent, electroconductive substrate for display panel, and organic electroluminescence device SUMITOMO METAL MINING CO., LTD. (JP) 2007-10-02 US disclosed
US-20060284143-A1 Transparent conductive thin film, process for producing the same, sintered target for producing the same, and transparent, electroconductive substrate for display panel, and organic electroluminiscence device SUMITOMO METAL MINING CO., LTD. (JP) 2006-12-21 US disclosed
US-7125503-B2 Transparent conductive thin film, process for producing the same, sintered target for producing the same, and transparent, electroconductive substrate for display panel, and organic electroluminescence device SUMITOMO METAL MINING CO., LTD. (JP) 2006-10-24 US disclosed
US-20060219988-A1 Transparent conductive thin film, process for producing the same, sintered target for producing the same, and transparent, electroconductive substrate for display panel, and organic electroluminescence device SUMITOMO METAL MINING CO., LTD. (JP) 2006-10-05 US disclosed
US-20050224766-A1 Transparent conductive thin film, process for producing the same, sintered target for producing the same, and transparent, electroconductive substrate for display panel, and organic electroluminescence device SUMITOMO METAL MINING CO., LTD. 2005-10-13 US disclosed
US-6911163-B2 TRANSPARENT CONDUCTIVE THIN FILM, PROCESS FOR PRODUCING THE SAME, SINTERED TARGET FOR PRODUCING THE SAME, AND TRANSPARENT, ELECTROCONDUCTIVE SUBSTRATE FOR DISPLAY PANEL, AND ORGANIC ELECTROLUMINESCENE DEVICE SUMITOMO METAL MINING CO., LTD. (JP) 2005-06-28 US disclosed
US-20030218153-A1 Transparent conductive thin film, process for producing the same, sintered target for producing the same, and transparent, electroconductive substrate for display panel, and organic electroluminescence device SUMITOMO METAL MINING CO., LTD. (JP) 2003-11-27 US disclosed