Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 3/20 | 0.70 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.70 |
| ▸ | FYN | P06241 | 1/20 | 0.70 |
| ▸ | MAOA | P21397 | 1/20 | 0.70 |
| ▸ | ACHE | P22303 | 1/20 | 0.70 |
| ▸ | AHR | P35869 | 1/20 | 0.70 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.67 |
| ▸ | HSD17B10 | Q99714 | 6/20 | 0.67 |
| ▸ | HPGD | P15428 | 4/20 | 0.67 |
| ▸ | THRB | P10828 | 1/20 | 0.67 |
| ▸ | TSHR | P16473 | 4/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.47 |
| ▸ | HPRT1 | P00492 | 3/20 | 0.46 |
| ▸ | CYP1B1 | Q16678 | 3/20 | 0.46 |
| ▸ | CYP1A1 | P04798 | 2/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | CASP1 | P29466 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4850496 | 1.00 | CYP1A2 (0.70) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL4855117 | 0.96 | CYP1A2 (0.69) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL5480086 | 0.92 | ALDH1A1 (0.60) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL416893 | 0.92 | ALDH1A1 (0.60) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL4846773 | 0.92 | CYP1A2 (0.70) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL4850561 | 0.91 | CYP1A2 (0.69) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL11302650 | 0.91 | ALDH1A1 (0.56) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL4848726 | 0.90 | CYP1A2 (0.68) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL4846707 | 0.90 | CYP1A2 (0.62) | CYP1A2ERBB2FYNMAOAACHE | |
| SCHEMBL4851950 | 0.90 | CYP1A2 (0.68) | CYP1A2ERBB2FYNMAOAACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7470290-B2 | Hydroscopic polymer gels for easier cleaning | THE CLOROX COMPANY (US) | 2008-12-30 | — | — | US | disclosed |
| US-7183010-B2 | Organic light-emitting diode devices with improved operational stability | EASTMAN KODAK CORPORATION (US) | 2007-02-27 | — | — | US | disclosed |
| US-20050245428-A1 | Hydroscopic polymer gels for easier cleaning | RODRIGUES KLIN A | 2005-11-03 | — | — | US | disclosed |
| US-6806019-B2 | COATING SUBSTRATES WITH PHOTORESIST MIXTURES COMPRISING NOVOLAKS, ACRYLIC ESTER COPOLYMERS AND PHOTOSENSITIZERS, THEN EXPOSING THE COATINGS AND DEVELOPING, TO FORM SEMICONDUCTORS OR FLAT PANEL DISPLAYS | CLARIANT FINANCE (BVI) LIMITED (VG) | 2004-10-19 | — | — | US | disclosed |
| EP-1224043-B1 | A METHOD TO REMEDIATE SOIL USING A SURFACTANT OF A SALT OF AN ACRYLAMIDOALKANESULFONIC ACID-AMINE REACTION PRODUCT | LUBRIZOL CORP (US) | 2004-09-22 | — | — | EP | disclosed |
| US-20040170917-A1 | Method of forming thick resist pattern | AZ ELECTRONIC MATERIALS USA CORP. | 2004-09-02 | — | — | US | disclosed |
| US-20040076853-A1 | Organic light-emitting diode devices with improved operational stability | EASTMAN KODAK COMPANY | 2004-04-22 | — | — | US | disclosed |
| EP-1400850-A1 | METHOD OF FORMING THICK RESIST PATTERN | CLARIANT INTERNATIONAL LTD. (CH) | 2004-03-24 | — | — | EP | disclosed |
| EP-1345081-A1 | HIGH-RESOLUTION PHOTOSENSITIVE RESIN COMPOSITION USABLE WITH I-LINE AND METHOD OF FORMING PATTERN | Clariant International Ltd. (CH) | 2003-09-17 | — | — | EP | disclosed |
| US-6537719-B1 | Both a resin and a photosensitive material, wherein a fluorescent material is incorporated | CLARIANT FINANCE (BVI) LIMITED (VG) | 2003-03-25 | — | — | US | disclosed |
| EP-1224042-A1 | A METHOD TO REMEDIATE SOIL USING A SURFACTANT OF AN ALKENYLSUCCINIC ANHYDRIDE OR ACID REACTED WITH AN AMINE ACID OR SALT OF AN AMINE ACID | The Lubrizol Corporation (US) | 2002-07-24 | — | — | EP | disclosed |
| US-6326187-B1 | SURFACTANT WITH SULFONATE, SULFATE OR CARBOXY ACID SALTS FOR SOILS | THE LUBRIZOL CORPORATION | 2001-12-04 | — | — | US | disclosed |
| EP-1126319-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF IMPROVING DRY ETCHING RESISTANCE OF PHOTOSENSITIVE RESIN COMPOSITION | CLARIANT INTERNATIONAL LTD. (CH) | 2001-08-22 | — | — | EP | disclosed |
| US-6264399-B1 | HYDROPHOBIC ORGANIC CHEMICAL BECOMES ASSOCIATED WITH THE AQUEOUS COMPOSITION AND CAN BE REMOVED FROM THE SOIL OR DECONTAMINATED BY A BIOLOGICAL PROCESS | THE LUBRIZOL CORPORATION | 2001-07-24 | — | — | US | disclosed |
| WO-2001026832-A1 | A METHOD TO REMEDIATE SOIL USING A SURFACTANT OF AN ALKENYLSUCCINIC ANHYDRIDE OR ACID REACTED WITH AN AMINE ACID OR SALT OF AN AMINE ACID | THE LUBRIZOL CORPORATION (US) | 2001-04-19 | — | — | WO | disclosed |
| WO-2001026831-A1 | A METHOD TO REMEDIATE SOIL USING A SURFACTANT OF A SALT OF AN ACRYLAMIDOALKANESULFONIC ACID-AMINE REACTION PRODUCT | THE LUBRIZOL CORPORATION (US) | 2001-04-19 | — | — | WO | disclosed |
| EP-1087260-A1 | PHOTOSENSITIVE RESIN COMPOSITION | CLARIANT INTERNATIONAL LTD. (CH) | 2001-03-28 | — | — | EP | disclosed |
| WO-1994026166-A2 | CARTRIDGES FOR DEVELOPING LATENT FINGERPRINTS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1994-11-24 | — | — | WO | disclosed |
| EP-0182612-A2 | Storage container of samples for analysis | TESSEK SDRUZENI PRAHA (CS) | 1986-05-28 | — | — | EP | disclosed |
| US-4224458-A | Process for homogeneous hydrogenation of polycyclic aromatic hydrocarbons | ALLIED CHEMICAL CORPORATION (US) | 1980-09-23 | — | — | US | disclosed |