SCHEMBL4847355

SCHEMBL4847355

c1ccc2c(c1)ccc1c2cc2ccc3cccc4ccc1c2c34

nearest known ligand 0.77

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 5/20 0.77
FYN P06241 2/20 0.77
ACHE P22303 2/20 0.77
AHR P35869 2/20 0.77
ERBB2 P04626 1/20 0.77
MAOA P21397 1/20 0.77
ALDH1A1 P00352 7/20 0.67
HSD17B10 Q99714 6/20 0.67
HPGD P15428 4/20 0.67
THRB P10828 1/20 0.67
HPRT1 P00492 4/20 0.58
CYP1B1 Q16678 2/20 0.54
HIF1A Q16665 2/20 0.54
TSHR P16473 4/20 0.50
TDP1 Q9NUW8 2/20 0.50
CYP2A6 P11509 1/20 0.50
LCK P06239 1/20 0.49
ADORA3 P0DMS8 1/20 0.49
MAPT P10636 1/20 0.49
SLC6A2 P23975 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4847418 1.00 CYP1A2 (0.77) CYP1A2FYNACHEAHRERBB2
SCHEMBL4849370 0.94 CYP1A2 (0.75) CYP1A2FYNACHEAHRERBB2
SCHEMBL4853263 0.94 HPRT1 (0.67) CYP1A2FYNACHEAHRERBB2
SCHEMBL5481478 0.92 CYP1A2 (0.66) CYP1A2FYNACHEAHRERBB2
SCHEMBL4849418 0.92 CYP1A2 (0.71) CYP1A2FYNACHEAHRERBB2
Benzo[Def]Chrysene SCHEMBL17008909 0.92 CYP1A2 (0.92) CYP1A2FYNACHEAHRERBB2
Benzo[Def]Chrysene SCHEMBL21328003 0.92 CYP1A2 (0.92) CYP1A2FYNACHEAHRERBB2
SCHEMBL5413311 0.91 ALDH1A1 (0.71) CYP1A2FYNACHEAHRERBB2
SCHEMBL4845505 0.90 CYP1A2 (0.81) CYP1A2FYNACHEAHRERBB2
Dibenz[A,H]Anthracene SCHEMBL25398496 0.90 CYP1A2 (0.88) CYP1A2FYNACHEAHRERBB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5989737-A Organic electroluminescent devices XEROX CORPORATION (US) 1999-11-23 US claimed
US-12227625-B2 Composite materials comprising mechanical ligands NANOCORE APS (DK) 2025-02-18 US disclosed
EP-4119598-A1 NANOCOMPOSITE MATERIALS COMPRISING MECHANICAL LIGANDS Nanocore ApS (DK) 2023-01-18 EP disclosed
EP-3737711-B1 COMPOSITE MATERIALS COMPRISING MECHANICAL LIGANDS NANOCORE APS (DK) 2022-04-06 EP disclosed
US-20200354220-A1 COMPOSITE MATERIALS COMPRISING MECHANICAL LIGANDS NANOCORE APS (DK) 2020-11-12 US disclosed
US-7470290-B2 Hydroscopic polymer gels for easier cleaning THE CLOROX COMPANY (US) 2008-12-30 US disclosed
US-7183010-B2 Organic light-emitting diode devices with improved operational stability EASTMAN KODAK CORPORATION (US) 2007-02-27 US disclosed
US-20050245428-A1 Hydroscopic polymer gels for easier cleaning RODRIGUES KLIN A 2005-11-03 US disclosed
US-20040076853-A1 Organic light-emitting diode devices with improved operational stability EASTMAN KODAK COMPANY 2004-04-22 US disclosed
EP-0872903-B1 Method for making hydrogen storage alloy powder and electrode comprising the alloy powder SHINETSU CHEMICAL CO (JP) 2001-10-04 EP disclosed
US-6277519-B1 QUENCHING AN ALLOY MELT; COMMINUTION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-08-21 US disclosed
US-5989737-A Organic electroluminescent devices XEROX CORPORATION (US) 1999-11-23 US disclosed
EP-0450862-B1 Organic thin film element TOSHIBA KK (JP) 1999-06-30 EP disclosed
EP-0872903-A1 Method for making hydrogen storage alloy powder and electrode comprising the alloy powder Shin-Etsu Chemical Co., Ltd. (JP) 1998-10-21 EP disclosed
US-5155566-A ORGANIC THIN FILM ELEMENT KABUSHIKI KAISHA TOSHIBA (JP) 1992-10-13 US disclosed
EP-0450862-A2 Organic thin film element KABUSHIKI KAISHA TOSHIBA (JP) 1991-10-09 EP disclosed
EP-0172427-B1 PROCESS FOR PRODUCTION OF VINYL CHLORIDE POLYMER Shin-Etsu Chemical Co., Ltd. (JP) 1989-07-05 EP disclosed
US-4758639-A Process for production of vinyl polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-19 US disclosed
US-4757124-A Suspension or emulsion polymerizing vinyl chloride monomer or mixture of vinyl chloride with vinyl monomer copolymerizable therewith in reactor with walls coated with antiscaling compound containing dye or pigments SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-12 US disclosed
EP-0172427-A2 Process for production of vinyl chloride polymer Shin-Etsu Chemical Co., Ltd. (JP) 1986-02-26 EP disclosed