⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL383720 | 0.80 | — | — | |
| SCHEMBL226644 | 0.78 | — | — | |
| SCHEMBL3039715 | 0.78 | — | — | |
| SCHEMBL1679352 | 0.76 | — | — | |
| SCHEMBL1548001 | 0.75 | — | — | |
| SCHEMBL1548003 | 0.75 | — | — | |
| SCHEMBL8695678 | 0.74 | EPHX1 (0.54) | — | |
| SCHEMBL16892551 | 0.72 | EPHX1 (0.58) | — | |
| SCHEMBL16892592 | 0.72 | EPHX1 (0.58) | — | |
| SCHEMBL1405864 | 0.72 | EPHX1 (0.58) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106660363-B | Liquid ejection head, method of producing the same, liquid ejection apparatus, and image forming apparatus | 株式会社理光 | 2018-07-06 | — | — | CN | claimed |
| CN-106660363-A | Liquid ejection head, method of producing the same, liquid ejection apparatus, and image forming apparatus | 株式会社理光 | 2017-05-10 | — | — | CN | claimed |
| WO-2023193903-A1 | AQUEOUS DISPERSIONS OF PRE-CROSSLINKED ORGANOPOLYSILOXANES | WACKER CHEMIE AG (DE) | 2023-10-12 | — | — | WO | disclosed |
| US-11781066-B2 | Wet etching composition and method | ENTEGRIS, INC. (US) | 2023-10-10 | — | — | US | disclosed |
| EP-4041845-A1 | WET ETCHING COMPOSITION AND METHOD | Entegris, Inc. (US) | 2022-08-17 | — | — | EP | disclosed |
| US-11365351-B2 | Wet etching composition and method | ENTEGRIS, INC. (US) | 2022-06-21 | — | — | US | disclosed |
| US-20210108140-A1 | WET ETCHING COMPOSITION AND METHOD | MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT | 2021-04-15 | — | — | US | disclosed |
| WO-2021072091-A1 | WET ETCHING COMPOSITION AND METHOD | ENTEGRIS, INC. (US) | 2021-04-15 | — | — | WO | disclosed |
| CN-104733464-B | Non-volatile memory device and its manufacturing method including electric charge capture layer | SK新技术株式会社 | 2019-11-05 | — | — | CN | disclosed |
| CN-106062082-B | Solidification compound | 株式会社钟化 | 2019-03-12 | — | — | CN | disclosed |
| CN-104037230-B | Single-electronic transistor and its manufacturing method | SK新技术株式会社 | 2019-01-25 | — | — | CN | disclosed |
| CN-104733466-A | NON-VOLATILE MEMORY DEVICE INCLUDING FLEXIBLE CHARGE TRAPPING LAYER AND METHOD FOR FABRICATING THE SAME | SK INNOVATION CO LTD | 2015-06-24 | — | — | CN | disclosed |
| CN-104733613-A | Method For Fabricating Nano Structure Including Dielectric Particle Supporters | SK INNOVATION CO LTD | 2015-06-24 | — | — | CN | disclosed |
| CN-104733408-A | Nano structure | SK INNOVATION CO LTD | 2015-06-24 | — | — | CN | disclosed |
| CN-104724667-A | Method for fabricating a nano structure | SK INNOVATION CO LTD | 2015-06-24 | — | — | CN | disclosed |
| CN-104724660-A | Flexible nano structure | SK INNOVATION CO LTD | 2015-06-24 | — | — | CN | disclosed |
| EP-2736483-A2 | COSMETIC COMPOSITIONS | Wacker Chemie AG (DE) | 2014-06-04 | — | — | EP | disclosed |
| WO-2013014140-A2 | COSMETIC COMPOSITIONS | WACKER CHEMIE AG (DE) | 2013-01-31 | — | — | WO | disclosed |
| US-7326410-B2 | Hair conditioner compositions | KAO CORPORATION (JP) | 2008-02-05 | — | — | US | disclosed |
| US-20050180941-A1 | Conditioner | KAO CORPORATION (JP) | 2005-08-18 | — | — | US | disclosed |