Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIN1 | Q05586 | 8/20 | 0.62 |
| ▸ | GRIN2A | Q12879 | 8/20 | 0.62 |
| ▸ | GRIN2D | O15399 | 7/20 | 0.62 |
| ▸ | GRIN3B | O60391 | 7/20 | 0.62 |
| ▸ | GRIN2B | Q13224 | 7/20 | 0.62 |
| ▸ | GRIN2C | Q14957 | 7/20 | 0.62 |
| ▸ | GRIN3A | Q8TCU5 | 7/20 | 0.62 |
| ▸ | LMNA | P02545 | 4/20 | 0.62 |
| ▸ | SLC22A1 | O15245 | 2/20 | 0.62 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.62 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.62 |
| ▸ | TSHR | P16473 | 1/20 | 0.62 |
| ▸ | STAT6 | P42226 | 1/20 | 0.62 |
| ▸ | SLC47A1 | Q96FL8 | 1/20 | 0.62 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.62 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.60 |
| ▸ | ESR1 | P03372 | 1/20 | 0.60 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.60 |
| ▸ | ACHE | P22303 | 1/20 | 0.60 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.60 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Amantadine SCHEMBL4846924 | 0.90 | GRIN1 (0.81) | GRIN1GRIN2AGRIN2DGRIN3BGRIN2B | |
| SCHEMBL12604983 | 0.88 | — | — | |
| Iodide SCHEMBL23880344 | 0.84 | — | — | |
| Hydrochloric Acid SCHEMBL17453367 | 0.84 | — | — | |
| SCHEMBL24254930 | 0.83 | GRIN1 (0.53) | GRIN1GRIN2AGRIN2DGRIN3BGRIN2B | |
| SCHEMBL5608718 | 0.83 | PKM (0.60) | GRIN1GRIN2AGRIN2DGRIN3BGRIN2B | |
| SCHEMBL5608589 | 0.83 | GRIN1 (0.90) | GRIN1GRIN2AGRIN2DGRIN3BGRIN2B | |
| SCHEMBL12132159 | 0.79 | GRIN1 (0.65) | GRIN1GRIN2AGRIN2DGRIN3BGRIN2B | |
| SCHEMBL12130587 | 0.79 | GRIN1 (0.65) | GRIN1GRIN2AGRIN2DGRIN3BGRIN2B | |
| SCHEMBL9914296 | 0.79 | GRIN1 (0.65) | GRIN1GRIN2AGRIN2DGRIN3BGRIN2B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7396778-B2 | Method for synthesizing polymeric material, method for forming polymer thin film and method for forming interlayer insulating film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2008-07-08 | — | — | US | claimed |
| US-20050245097-A1 | Method for synthesizing polymeric material, method for forming polymer thin film and method for forming interlayer insulating film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-11-03 | — | — | US | claimed |
| US-6936552-B2 | Method for synthesizing polymeric material, method for forming polymer thin film and method for forming interlayer insulating film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-08-30 | — | — | US | claimed |
| EP-1493771-A1 | METHOD OF SYNTHESIZING POLYMERIC MATERIAL, METHOD OF FORMING THIN POLYMER FILM, AND METHOD OF FORMING INTERLAYER DIELECTRIC | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-01-05 | — | — | EP | claimed |
| CN-1514850-A | Method for synthesizing polymer material, method for forming polymer thin film, and method for forming interlayer insulating film | ���µ�����ҵ��ʽ���� | 2004-07-21 | — | — | CN | claimed |
| US-20040087182-A1 | Method for synthesizing polymeric material, method for forming polymer thin film and method for forming interlayer insulating film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD | 2004-05-06 | — | — | US | claimed |
| US-20240122065-A1 | METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | TOSOH CORPORATION (JP) | 2024-04-11 | — | — | US | disclosed |
| EP-4198163-A1 | METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | Tosoh Corporation (JP) | 2023-06-21 | — | — | EP | disclosed |
| CN-116157382-A | Material for metal patterning, amine compound, electronic device, and method for forming metal pattern | 东曹株式会社 | 2023-05-23 | — | — | CN | disclosed |
| US-7396778-B2 | Method for synthesizing polymeric material, method for forming polymer thin film and method for forming interlayer insulating film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2008-07-08 | — | — | US | disclosed |
| US-RE39744-E1 | Adamantane derivatives and process for producing them | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2007-07-24 | — | — | US | disclosed |
| EP-1593704-A2 | Precursor solution for organic polymer film formation and method for forming organic polymer film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-11-09 | — | — | EP | disclosed |
| US-20050245097-A1 | Method for synthesizing polymeric material, method for forming polymer thin film and method for forming interlayer insulating film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-11-03 | — | — | US | disclosed |
| US-20050234157-A1 | Precursor solution for organic polymer film formation and method for forming organic polymer film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2005-10-20 | — | — | US | disclosed |
| US-6936552-B2 | Method for synthesizing polymeric material, method for forming polymer thin film and method for forming interlayer insulating film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-08-30 | — | — | US | disclosed |
| EP-1493771-A1 | METHOD OF SYNTHESIZING POLYMERIC MATERIAL, METHOD OF FORMING THIN POLYMER FILM, AND METHOD OF FORMING INTERLAYER DIELECTRIC | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-01-05 | — | — | EP | disclosed |
| CN-1514850-A | Method for synthesizing polymer material, method for forming polymer thin film, and method for forming interlayer insulating film | ���µ�����ҵ��ʽ���� | 2004-07-21 | — | — | CN | disclosed |
| US-20040087182-A1 | Method for synthesizing polymeric material, method for forming polymer thin film and method for forming interlayer insulating film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD | 2004-05-06 | — | — | US | disclosed |
| US-6392104-B1 | CHEMICAL INTERMEDIATES FOR DRUGS, AGRICULTURE | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-05-21 | — | — | US | disclosed |
| EP-0927711-A1 | ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THEM | Daicel Chemical Industries, Ltd. (JP) | 1999-07-07 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050245097-A1 | Method for synthesizing polymeric material, method for forming polymer thin film and method for forming interlayer insulating film | PARG, STOM, DNMT1 | GRIN1 192/4885GRIN2A 118/4885GRIN2D 226/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.