SCHEMBL4853802

SCHEMBL4853802

CC(C)(O)c1ccc(CCCc2ccc(C(C)(C)O)cc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 1/20 0.47
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
PTPN2 P17706 1/20 0.42
PTPN1 P18031 1/20 0.42
PTPN6 P29350 1/20 0.42
PTPN11 Q06124 1/20 0.42
SIGMAR1 Q99720 3/20 0.42
LMNA P02545 2/20 0.41
CALM1 P0DP23 1/20 0.41
ESRRG P62508 1/20 0.40
SLC13A5 Q86YT5 2/20 0.40
ESR1 P03372 3/20 0.39
ADRA2A P08913 2/20 0.39
ADORA3 P0DMS8 2/20 0.39
TACR2 P21452 2/20 0.39
SLC6A2 P23975 2/20 0.39
SLC6A4 P31645 2/20 0.39
SLC6A3 Q01959 2/20 0.39
KDM4E B2RXH2 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18802714 0.95 KCNH2 (0.52) KCNH2MEN1KMT2APTPN2PTPN1
SCHEMBL18802741 0.93 KCNH2 (0.50) KCNH2MEN1KMT2APTPN2PTPN1
SCHEMBL18802705 0.93 KCNH2 (0.50) KCNH2MEN1KMT2APTPN2PTPN1
SCHEMBL548414 0.92 HTR2A (0.50) MEN1KMT2AESRRGSLC6A3
SCHEMBL548192 0.90 MEN1 (0.45) KCNH2MEN1KMT2ASIGMAR1CALM1
SCHEMBL18911119 0.89 CA2 (0.52) LMNAESR1ADRA2AADORA3TACR2
SCHEMBL4949030 0.87 TAAR1 (0.44) KCNH2MEN1KMT2APTPN2PTPN1
SCHEMBL18905474 0.87 KCNH2 (0.42) KCNH2MEN1KMT2APTPN2PTPN1
SCHEMBL547815 0.87 MAOB (0.50) KCNH2PTPN2PTPN1PTPN6PTPN11
SCHEMBL547565 0.86 HDAC1 (0.50) SIGMAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170121437-A1 PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND MASK BLANK FUJIFILM CORPORATION (JP) 2017-05-04 US disclosed
US-7323284-B2 Negative type radiation sensitive resin composition JSR CORPORATION (JP) 2008-01-29 US disclosed
US-20030022095-A1 Negative type radiation sensitive resin composition JSR CORPORATION (JP) 2003-01-30 US disclosed
EP-0328643-B1 (alpha)-HYDROPEROXYISOPROPYLPHENYL COMPOUNDS AND PROCESS FOR THEIR PREPARATION TERUMO CORP (JP) 1994-07-06 EP disclosed
US-5043142-A Measuring peroxide-active substances TERUMO KABUSHIKI KAISHA (JP) 1991-08-27 US disclosed
EP-0328643-A1 (alpha)-HYDROPEROXYISOPROPYLPHENYL COMPOUNDS AND PROCESS FOR THEIR PREPARATION TERUMO KABUSHIKI KAISHA (JP) 1989-08-23 EP disclosed