Acrylic Acid

Acrylic Acid

SCHEMBL4855025

C=CC(=O)O.C=CC(=O)OCO

nearest known ligand 0.56

Full drug profile on Sugi Atlas →

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.56
ALDH1A1 P00352 4/20 0.50
TP53 P04637 3/20 0.50
HIF1A Q16665 3/20 0.50
CYP3A4 P08684 2/20 0.50
HSD17B10 Q99714 2/20 0.50
MAPK1 P28482 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
LMNA P02545 1/20 0.50
HPGD P15428 1/20 0.45
THRB P10828 2/20 0.41
ALOX15 P16050 1/20 0.38
HCAR2 Q8TDS4 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31539995 0.92 TSHR (0.64) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL29366134 0.92 TSHR (0.64) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL183849 0.92
SCHEMBL30861276 0.90
Ammonia Solution, Strong SCHEMBL28046213 0.90
SCHEMBL29042736 0.90
Water SCHEMBL9838309 0.90
Hydrochloric Acid SCHEMBL28018811 0.90
SCHEMBL28709737 0.90
Acrylic Acid Methyl Ester SCHEMBL4858706 0.89 TSHR (0.47) TSHRALDH1A1TP53HIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109755438-B Battery diaphragm, preparation method thereof and lithium battery 比亚迪股份有限公司 2020-09-15 CN claimed
CN-109755438-B Battery diaphragm, preparation method thereof and lithium battery 比亚迪股份有限公司 2020-09-15 CN disclosed
US-7399570-B2 Water-soluble negative photoresist polymer and composition containing the same HYNIX SEMICONDUCTOR INC. (KR) 2008-07-15 US disclosed
US-20050282080-A1 Water-soluble negative photoresist polymer and composition containing the same HYNIX SEMICONDUCTOR INC. (KR) 2005-12-22 US disclosed