Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.65 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.43 |
| ▸ | GRM1 | Q13255 | 6/20 | 0.41 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.35 |
| ▸ | PDE4A | P27815 | 4/20 | 0.35 |
| ▸ | PDE4B | Q07343 | 4/20 | 0.35 |
| ▸ | PDE4C | Q08493 | 4/20 | 0.35 |
| ▸ | PDE4D | Q08499 | 4/20 | 0.35 |
| ▸ | POLB | P06746 | 2/20 | 0.33 |
| ▸ | CTSV | O60911 | 1/20 | 0.33 |
| ▸ | CTSL | P07711 | 1/20 | 0.33 |
| ▸ | CTSS | P25774 | 1/20 | 0.33 |
| ▸ | CTSK | P43235 | 1/20 | 0.33 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31695293 | 0.86 | ATM (0.71) | ATMCYP19A1GRM1EPHX2PDE4A | |
| SCHEMBL29353750 | 0.81 | ATM (0.65) | ATMCYP19A1GRM1EPHX2PDE4A | |
| SCHEMBL641536 | 0.81 | ATM (0.65) | ATMCYP19A1GRM1EPHX2PDE4A | |
| SCHEMBL7204416 | 0.81 | ATM (0.59) | ATMCYP19A1GRM1EPHX2PDE4A | |
| SCHEMBL31695282 | 0.80 | ATM (0.54) | ATMCYP19A1GRM1PDE4APDE4B | |
| SCHEMBL20636604 | 0.80 | ATM (0.54) | ATMCYP19A1GRM1PDE4APDE4B | |
| SCHEMBL2623615 | 0.79 | ATM (0.56) | ATMCYP19A1GRM1 | |
| SCHEMBL15219695 | 0.79 | ATM (0.56) | ATMCYP19A1GRM1 | |
| SCHEMBL8861152 | 0.79 | ATM (0.56) | ATMCYP19A1GRM1 | |
| SCHEMBL3073477 | 0.78 | ATM (0.59) | ATMCYP19A1GRM1EPHX2POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7351521-B2 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2008-04-01 | — | — | US | claimed |
| US-20070172762-A1 | Photoresist composition for deep ultraviolet lithography | DAMMEL RALPH R | 2007-07-26 | — | — | US | claimed |
| US-20070154841-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2007-07-05 | — | — | US | claimed |
| US-7211366-B2 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2007-05-01 | — | — | US | claimed |
| US-20040166433-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2004-08-26 | — | — | US | claimed |