SCHEMBL4860197

SCHEMBL4860197

C=CC(=O)OC(CC)[Si](OC(C)OC)(OC(C)OC)OC(C)OC

nearest known ligand 0.36

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.36
HPGD P15428 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2553653 0.85 TSHR (0.39) TSHRHPGD
SCHEMBL110060 0.82 TSHR (0.37) TSHRHPGD
SCHEMBL11118154 0.82 TSHR (0.37) TSHRHPGD
SCHEMBL29249892 0.81 TSHR (0.36) TSHRHPGD
SCHEMBL139016 0.80 TSHR (0.36) TSHRHPGD
SCHEMBL80262 0.78 TSHR (0.36) TSHR
Cyclopropane SCHEMBL29098034 0.78 TSHR (0.34) TSHRHPGD
SCHEMBL28078305 0.78 TSHR (0.34) TSHRHPGD
SCHEMBL109906 0.77 TSHR (0.36) TSHRHPGD
SCHEMBL21670465 0.76 TSHR (0.33) TSHRHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12097497-B2 Cell accommodating chip YAMATO SCIENTIFIC CO., LTD. (JP) 2024-09-24 US disclosed
US-7326762-B2 Copolymer having reactive silicon-containing group and organic-inorganic hybrid polymeric material ORIENT CHEMICAL INDUSTRIES, LTD. (JP) 2008-02-05 US disclosed
US-7283715-B2 Optical waveguide forming material and method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-10-16 US disclosed
US-7157542-B2 produced by polymerizing an unsaturated reactive silicon-containing monomer and a compatible unsaturated monomer (especially ethylene) using a macropolymerization initiator having a polycondensation segment (especially polycarbonate) ORIENT CHEMICAL INDUSTRIES, LTD. (JP) 2007-01-02 US disclosed
US-20060100405-A1 Copolymer having reactive silicon-containing group and organic-inorganic hybrid polymeric material ARAKAWA MOTOOMI 2006-05-11 US disclosed
US-20050025442-A1 Optical waveguide forming material and method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-02-03 US disclosed
US-20040127663-A1 Copolymer having reactive silicon-containing group and organic-inorganic hybrid polymeric material ORIENT CHEMICAL INDUSTRIES, LTD. (JP) 2004-07-01 US disclosed
EP-1433798-A1 Copolymer having reactive silicon-containing group and organic-inorganic hybrid polymeric material Orient Chemical Industries, Ltd. (JP) 2004-06-30 EP disclosed
US-20030148226-A1 Optical waveguide forming material and method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-08-07 US disclosed
US-5738976-A HEAT RESISTANT, STORAGE STABLE POLYSILSESQUIOXANE MIXED WITH PHOTOSENSITIZER; PHOTORESISTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-04-14 US disclosed
EP-0218866-B1 PROCESS FOR PREPARING CURABLE CASTING RESINS RÖHM GMBH (DE) 1989-06-21 EP disclosed