Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 9/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 8/20 | 0.50 |
| ▸ | HPGD | P15428 | 7/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.50 |
| ▸ | ESR1 | P03372 | 1/20 | 0.50 |
| ▸ | ITGB3 | P05106 | 1/20 | 0.50 |
| ▸ | ITGA2B | P08514 | 1/20 | 0.50 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | GGT1 | P19440 | 1/20 | 0.50 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.50 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.50 |
| ▸ | BLM | P54132 | 1/20 | 0.50 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | CA12 | O43570 | 1/20 | 0.46 |
| ▸ | CA1 | P00915 | 1/20 | 0.46 |
| ▸ | CA2 | P00918 | 1/20 | 0.46 |
| ▸ | CA7 | P43166 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phthalic Acid SCHEMBL27855768 | 0.97 | KDM4E (0.51) | KDM4EHSD17B10HPGDALDH1A1MAPK1 | |
| SCHEMBL5506364 | 0.88 | ELANE (0.57) | KDM4EHSD17B10HPGDALDH1A1MAPK1 | |
| SCHEMBL1156927 | 0.84 | KDM4E (0.70) | KDM4EHSD17B10HPGDALDH1A1MAPK1 | |
| SCHEMBL16966572 | 0.84 | KDM4E (0.70) | KDM4EHSD17B10HPGDALDH1A1MAPK1 | |
| SCHEMBL29981543 | 0.84 | KDM4E (0.70) | KDM4EHSD17B10HPGDALDH1A1MAPK1 | |
| SCHEMBL344654 | 0.84 | KDM4E (0.70) | KDM4EHSD17B10HPGDALDH1A1MAPK1 | |
| SCHEMBL28058206 | 0.84 | TSHR (0.49) | KDM4EHSD17B10HPGDALDH1A1MAPK1 | |
| SCHEMBL2340893 | 0.83 | KDM4E (0.50) | KDM4EHSD17B10HPGDALDH1A1MAPK1 | |
| Methacrylic Acid SCHEMBL30339930 | 0.83 | HTT (0.47) | KDM4EHSD17B10HPGDALDH1A1MAPK1 | |
| SCHEMBL28210923 | 0.83 | MAPK1 (0.68) | KDM4EHSD17B10HPGDALDH1A1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103168051-A | Active energy ray-curable resin composition and coating agent | NIPPON SYNTHETIC CHEM IND | 2013-06-19 | — | — | CN | disclosed |
| CN-102985483-A | Inorganic-organic hybrid material, optical material using same, and inorganic-organic composite composition | NIPPON KASEI CHEM | 2013-03-20 | — | — | CN | disclosed |
| CN-102695731-A | Active energy ray-curable composition and use thereof | NIPPON SYNTHETIC CHEM IND | 2012-09-26 | — | — | CN | disclosed |
| CN-102575129-A | Conductive coating film-forming agent, production method for same, and molded article using same | MITSUBISHI MATERIALS CORP | 2012-07-11 | — | — | CN | disclosed |
| CN-102529257-A | Transfer printing laminated body | NIPPON SYNTHETIC CHEM IND | 2012-07-04 | — | — | CN | disclosed |
| CN-100526404-C | Resin composition for coating | DAINIPPON INK & CHEMICALS (JP) | 2009-08-12 | — | — | CN | disclosed |
| US-7378224-B2 | Method for forming pattern, and optical element | JSR CORPORATION (JP) | 2008-05-27 | — | — | US | disclosed |
| CN-1984936-A | Active energy ray curable resin composition, method for producing the same, and coating agent composition using the same | NIPPON SYNTHETIC CHEM IND (JP) | 2007-06-20 | — | — | CN | disclosed |
| CN-1906258-A | Resin composition for coating | DAINIPPON INK & CHEMICALS (JP) | 2007-01-31 | — | — | CN | disclosed |
| EP-1296186-B1 | Radiation sensitive resin composition, rib, rib forming method and display element | JSR CORP (JP) | 2006-06-07 | — | — | EP | disclosed |
| US-20050014100-A1 | Method for forming pattern, and optical element | JSR CORPORATION (JP) | 2005-01-20 | — | — | US | disclosed |
| EP-1498776-A2 | Method for forming pattern, and optical element | JSR Corporation (JP) | 2005-01-19 | — | — | EP | disclosed |
| US-20030068574-A1 | Radiation sensitive resin composition, rib, rib forming method and display element | JSR CORPORATION (JP) | 2003-04-10 | — | — | US | disclosed |
| EP-1296186-A1 | Radiation sensitive resin composition, rib, rib forming method and display element | JSR Corporation (JP) | 2003-03-26 | — | — | EP | disclosed |
| EP-0759448-B1 | Ionizing radiation-curable resin composition for optical article, optical article, and surface light source | DAINIPPON PRINTING CO LTD (JP) | 2002-01-30 | — | — | EP | disclosed |
| EP-0880075-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2001-10-17 | — | — | EP | disclosed |
| US-5958648-A | Radiation sensitive resin composition | JSR CORPORATION (JP) | 1999-09-28 | — | — | US | disclosed |
| EP-0880075-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1998-11-25 | — | — | EP | disclosed |
| US-5714218-A | AN EPOXYACRYLATE HAVING CYCLIC STRUCTURE CONTAINING ATLEAST TWO ACRYLATE GROUPS AND MONOFUNCTIONAL ACRYLATE HAVING CYCLIC STRUCTURE; HIGH SURFACE HARDNESS, REFRACTIVE INDEX AND FREE FROM DEFORMATION | DAINIPPON PRINTING CO., LTD. (JP) | 1998-02-03 | — | — | US | disclosed |
| EP-0759448-A1 | Ionizing radiation-curable resin composition for optical article, optical article, and surface light source | Dainippon Printing Co., Ltd. (JP) | 1997-02-26 | — | — | EP | disclosed |