Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.41 |
| ▸ | TP53 | P04637 | 4/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | MGLL | Q99685 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16341758 | 0.86 | TSHR (0.46) | TSHRALDH1A1TP53CYP3A4HIF1A | |
| SCHEMBL21279992 | 0.85 | TSHR (0.47) | TSHRALDH1A1MGLL | |
| SCHEMBL12430365 | 0.85 | TSHR (0.47) | TSHRALDH1A1MGLL | |
| Acrylic Acid Methyl Ester SCHEMBL27780922 | 0.83 | ALDH1A1 (0.38) | TSHRALDH1A1MAPK1SMN1; SMN2 | |
| SCHEMBL12744515 | 0.83 | TSHR (0.45) | TSHRALDH1A1MGLL | |
| SCHEMBL7867278 | 0.83 | TSHR (0.42) | TSHRALDH1A1TP53CYP3A4HIF1A | |
| Isobutane SCHEMBL28150322 | 0.82 | ALDH1A1 (0.51) | TSHRALDH1A1TP53CYP3A4HPGD | |
| SCHEMBL2463533 | 0.82 | TSHR (0.50) | TSHRALDH1A1TP53CYP3A4HPGD | |
| SCHEMBL671633 | 0.81 | TSHR (0.43) | TSHRALDH1A1TP53CYP3A4 | |
| Acrylic Acid SCHEMBL76363 | 0.81 | ALDH1A1 (0.41) | TSHRALDH1A1TP53CYP3A4MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1564232-B1 | PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR THE FORMATION OF HYDROGEL | TOYO GOSEI CO LTD (JP) | 2008-08-20 | — | — | EP | disclosed |
| US-7408002-B2 | Photosensitive resin composition and process for the formation of hydrogel | TOYO GOSEI CO., LTD (JP) | 2008-08-05 | — | — | US | disclosed |
| US-20060041052-A1 | Photosensitive resin compostion and process for the formation of hydrogel | TOYO GOSEI CO., LTD (JP) | 2006-02-23 | — | — | US | disclosed |
| EP-1564232-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR THE FORMATION OF HYDROGEL | Toyo Gosei Co., Ltd. (JP) | 2005-08-17 | — | — | EP | disclosed |