SCHEMBL4863802

SCHEMBL4863802

C=C(C)C(=O)Oc1cc(C(=O)O)cc(C(=O)O)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.53
POLB P06746 1/20 0.43
APEX1 P27695 1/20 0.43
HTT P42858 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
KMT2A Q03164 3/20 0.41
ATM Q13315 1/20 0.41
TPMT P51580 1/20 0.39
PLA2G2A P14555 1/20 0.39
ALDH1A1 P00352 2/20 0.38
GAA P10253 2/20 0.38
KDM4E B2RXH2 1/20 0.38
TSHR P16473 1/20 0.38
RAB9A P51151 1/20 0.38
HSD17B10 Q99714 1/20 0.38
CA1 P00915 3/20 0.37
CA2 P00918 3/20 0.37
CA12 O43570 2/20 0.37
CA7 P43166 2/20 0.37
CA9 Q16790 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17044564 0.96 ELANE (0.53) ELANEPOLBAPEX1HTTTDP1
SCHEMBL19335905 0.90 ELANE (0.45) ELANEPOLBAPEX1HTTTDP1
SCHEMBL969378 0.90 TPMT (0.52) ELANEPOLBAPEX1HTTTDP1
SCHEMBL15357797 0.83 ELANE (0.53) ELANEPOLBAPEX1HTTTDP1
SCHEMBL15339040 0.82 ELANE (0.50) ELANEPOLBAPEX1HTTTDP1
SCHEMBL15357799 0.82 ELANE (0.50) ELANEPOLBAPEX1HTTTDP1
SCHEMBL15339042 0.82 ELANE (0.59) ELANEPOLBAPEX1HTTTDP1
SCHEMBL346386 0.82 ELANE (0.59) ELANEPOLBAPEX1HTTTDP1
SCHEMBL19333545 0.81 POLB (0.48) ELANEPOLBTDP1KMT2AATM
SCHEMBL346685 0.81 ELANE (0.72) ELANEPOLBAPEX1HTTTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7378224-B2 Method for forming pattern, and optical element JSR CORPORATION (JP) 2008-05-27 US disclosed
EP-1296186-B1 Radiation sensitive resin composition, rib, rib forming method and display element JSR CORP (JP) 2006-06-07 EP disclosed
US-6852476-B2 Radiation sensitive resin composition, rib, rib forming method and display element JSR CORPORATION (JP) 2005-02-08 US disclosed
US-20050014100-A1 Method for forming pattern, and optical element JSR CORPORATION (JP) 2005-01-20 US disclosed
EP-1498776-A2 Method for forming pattern, and optical element JSR Corporation (JP) 2005-01-19 EP disclosed
US-20030068574-A1 Radiation sensitive resin composition, rib, rib forming method and display element JSR CORPORATION (JP) 2003-04-10 US disclosed
EP-1296186-A1 Radiation sensitive resin composition, rib, rib forming method and display element JSR Corporation (JP) 2003-03-26 EP disclosed
EP-0880075-B1 Radiation sensitive resin composition JSR CORP (JP) 2001-10-17 EP disclosed
US-5958648-A Radiation sensitive resin composition JSR CORPORATION (JP) 1999-09-28 US disclosed
EP-0880075-A1 Radiation sensitive resin composition JSR Corporation (JP) 1998-11-25 EP disclosed