SCHEMBL4865264

SCHEMBL4865264

Cc1nccn1CC(O)CO

nearest known ligand 0.59

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 5/20 0.57
MEN1 O00255 3/20 0.57
ALDH1A1 P00352 3/20 0.57
HPGD P15428 2/20 0.57
MAPT P10636 1/20 0.57
AGER Q15109 1/20 0.57
KDM4E B2RXH2 2/20 0.55
POLB P06746 2/20 0.46
FDPS P14324 1/20 0.42
GAA P10253 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
LMNA P02545 1/20 0.40
AHCY P23526 1/20 0.40
ADORA2A P29274 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28437161 0.82 KMT2A (0.55) KMT2AMEN1ALDH1A1HPGDMAPT
SCHEMBL10667885 0.81 KMT2A (0.47) KMT2AMEN1ALDH1A1HPGDMAPT
SCHEMBL440678 0.81 KMT2A (0.53) KMT2AMEN1ALDH1A1HPGDMAPT
SCHEMBL2563628 0.77 KMT2A (0.38) KMT2AMEN1ALDH1A1HPGDMAPT
SCHEMBL6225250 0.77 KMT2A (0.54) KMT2AMEN1ALDH1A1HPGDMAPT
SCHEMBL179780 0.76 KMT2A (0.52) KMT2AMEN1ALDH1A1HPGDMAPT
SCHEMBL6647390 0.76
SCHEMBL5858402 0.75 ESR1 (0.54) KMT2AMEN1ALDH1A1MAPTAGER
SCHEMBL22639875 0.75 MEN1 (0.72) KMT2AMEN1ALDH1A1HPGDMAPT
SCHEMBL258791 0.75 MEN1 (0.76) KMT2AMEN1ALDH1A1HPGDMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7314701-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2008-01-01 US claimed
US-7314701-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2008-01-01 US disclosed
US-20050095527-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-05 US disclosed
EP-0211121-B1 PROCESS FOR SYNTHESIZING 2-VINYL-4,6-DIAMINO-S-TRIAZINE SHIKOKU CHEMICALS CORPORATION (JP) 1991-12-11 EP disclosed
EP-0211121-A1 Process for synthesizing 2-vinyl-4,6-diamino-s-triazine SHIKOKU CHEMICALS CORPORATION (JP) 1987-02-25 EP disclosed
US-4596868-A Process for synthesizing 2-vinyl-4,6-diamino-s-triazine SHIKOKU CHEMICALS CORPORATION (JP) 1986-06-24 US disclosed