⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12931389 | 0.83 | — | — | |
| SCHEMBL1402798 | 0.68 | — | — | |
| SCHEMBL14000288 | 0.68 | — | — | |
| SCHEMBL2369369 | 0.67 | — | — | |
| SCHEMBL1415199 | 0.66 | — | — | |
| SCHEMBL2376831 | 0.65 | TMEM97 (0.37) | — | |
| SCHEMBL21894805 | 0.62 | — | — | |
| SCHEMBL140216 | 0.62 | — | — | |
| SCHEMBL4858021 | 0.58 | — | — | |
| SCHEMBL1860634 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7456311-B2 | Adamantane derivative, process for producing the same, and photosensitive material for photoresist | IDEMITSU KOSAN CO., LTD. (JP) | 2008-11-25 | — | — | US | disclosed |
| US-20080009647-A1 | Adamantane Derivative, Process for Producing the Same, and Photosensitive Material for Photoresist | IDEMITSU KOSAN CO., LTD. (JP) | 2008-01-10 | — | — | US | disclosed |
| EP-1803708-A1 | ADAMANTANE DERIVATIVE, PROCESS FOR PRODUCING THE SAME, AND PHOTOSENSITIVE MATERIAL FOR PHOTORESIST | IDEMITSU KOSAN CO., LTD. (JP) | 2007-07-04 | — | — | EP | disclosed |