Acetoacetic Acid

Acetoacetic Acid

SCHEMBL487189

CC(=O)CC(=O)O.CC(=O)CC(=O)O.[Ti]

nearest known ligand 0.53

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LDHA P00338 1/20 0.53
SRR Q9GZT4 1/20 0.53
EGLN1 Q9GZT9 3/20 0.52
KDM4E B2RXH2 3/20 0.52
KDM5C P41229 2/20 0.52
PHF8 Q9UPP1 2/20 0.52
KDM2A Q9Y2K7 2/20 0.52
KDM6B O15054 1/20 0.52
LMNA P02545 2/20 0.47
SLC15A2 Q16348 1/20 0.47
MGAM O43451 1/20 0.45
GAA P10253 1/20 0.45
SI P14410 1/20 0.45
MGAM2 Q2M2H8 1/20 0.45
FFAR3 O14843 3/20 0.41
ALDH1A1 P00352 3/20 0.41
TDP1 Q9NUW8 2/20 0.41
GLRA1 P23415 1/20 0.41
SLC6A9 P48067 1/20 0.41
OR51E2 Q9H255 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetoacetic Acid SCHEMBL48784 1.00
Acetoacetic Acid SCHEMBL649090 0.96 LDHA (0.57) LDHASRREGLN1KDM4EKDM5C
Acetoacetic Acid SCHEMBL1144213 0.96 LDHA (0.57) LDHASRREGLN1KDM4EKDM5C
Acetoacetic Acid SCHEMBL6620 0.96
Acetoacetic Acid SCHEMBL1406366 0.96 LDHA (0.57) LDHASRREGLN1KDM4EKDM5C
Acetoacetic Acid SCHEMBL28972036 0.96 LDHA (0.57) LDHASRREGLN1KDM4EKDM5C
Acetoacetic Acid SCHEMBL31420005 0.96
Acetoacetic Acid SCHEMBL10941648 0.96 LDHA (0.57) LDHASRREGLN1KDM4EKDM5C
Acetoacetic Acid SCHEMBL21402364 0.96
Acetoacetic Acid SCHEMBL653110 0.96 LDHA (0.57) LDHASRREGLN1KDM4EKDM5C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5905109-A HYDROLYSIS AND CONDENSATION TO FORM POLYMERS WITH CATALYSTS JSR CORPORATION (JP) 1999-05-18 US claimed
EP-3150672-B1 THERMAL CONDUCTIVE SILICONE COMPOSITION AND SEMICONDUCTOR DEVICE SHINETSU CHEMICAL CO (JP) 2018-05-09 EP disclosed
US-20170096591-A1 THERMAL CONDUCTIVE SILICONE COMPOSITION AND SEMICONDUCTOR DEVICE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-06 US disclosed
EP-3150672-A1 THERMAL CONDUCTIVE SILICONE COMPOSITION AND SEMICONDUCTOR DEVICE Shin-Etsu Chemical Co., Ltd. (JP) 2017-04-05 EP disclosed
EP-2180019-B1 Resin composition, method of its composition, and cured formulation NIPPON CATALYTIC CHEM IND (JP) 2012-02-01 EP disclosed
US-7723407-B2 mixing a phenolic compound containing the inorganic microfine particle(SiO2) and a compound containing at least one of the glycidyl group and/or an epoxy group containing the inorganic microfine particle; fireproofing; good mechanical properties; heat resistance; automobiles, construction, electronics NIPPON SHOKUBAI CO., LTD. (JP) 2010-05-25 US disclosed
EP-2180019-A1 Resin composition, method of its composition, and cured formulation Nippon Shokubai Co., Ltd. (JP) 2010-04-28 EP disclosed
EP-1626065-B1 Resin composition, method of its composition, and cured formulation NIPPON CATALYTIC CHEM IND (JP) 2010-01-20 EP disclosed
EP-0809314-B1 Positive active material, method of manufacturing and secondary battery using the same CANON KK (JP) 2008-08-13 EP disclosed
EP-1022319-B1 Method of making coating layers containing photocatalyst and a photocatalyst coating glass formed thereby JSR CORP (JP) 2008-03-19 EP disclosed
US-20020076631-A1 Photoreceptor for forming electrostatic latent image KONICA CORPORATION (JP) 2002-06-20 US disclosed
EP-1195397-A1 Composition of cyclic olefin addition copolymer and cross-linked material JSR Corporation (JP) 2002-04-10 EP disclosed
US-6368764-B2 ELECTROCONDUCTIVE SUPPORT, PHOTOSENSITIVE LAYER CONTAINING CHARGE GENERATING AND CHARGE TRANSFER COMPOUNDS AND PROTECTIVE COATING MINOLTA CO., LTD. (JP) 2002-04-09 US disclosed
US-6365309-B1 POLYSILOXANE AND SILYL GROUP-CONTAINING VINYL RESIN; EXCELLENT DURABILITY AND ADHESION MINOLTA CO., LTD. (JP) 2002-04-02 US disclosed
US-20020031701-A1 High energy density secondary battery for repeated use KAWAKAMI SOICHIRO (JP) 2002-03-14 US disclosed
US-6335061-B1 FORMING ON SURFACE OF AN ORGANIC FILM AN (UNDER)COATING OF A COATING COMPOSED OF ORGANOSILANES, HYDROLYZATES OF THE ORGANOSILANES, AND CONDENSATES OF THE ORGANOSILANES AND, WHEN DESIRED, A POLYMER COMPONENT HAVING SILYL GROUPS JSR CORPORATION (JP) 2002-01-01 US disclosed
US-6280896-B1 MULTILAYER ELEMENT WITH SUPPORT AND SURFACE PROTECTANT WITH FLUORINE CONTAINING POLYSILOXANE MINOLTA CO., LTD. (JP) 2001-08-28 US disclosed
US-20010008738-A1 Photosensitive member for electrophotography MINOLTA CO., LTD. 2001-07-19 US disclosed
EP-1022319-A2 Method of making coating layers containing photocatalyst and a photocatalyst coating glass formed thereby JSR Corporation (JP) 2000-07-26 EP disclosed
EP-1022318-A2 Method of making coating layers containing photocatalyst and a photocatalyst coating film formed thereby JSR Corporation (JP) 2000-07-26 EP disclosed