Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 8/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.39 |
| ▸ | TP53 | P04637 | 5/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | MITF | O75030 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | NLRP1 | Q9C000 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4872026 | 0.84 | TSHR (0.40) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL23494377 | 0.82 | TSHR (0.56) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL8408099 | 0.81 | TSHR (0.44) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL31519532 | 0.80 | TSHR (0.44) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL4325855 | 0.77 | TSHR (0.53) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL9443516 | 0.77 | TSHR (0.42) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL1231300 | 0.75 | TSHR (0.47) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL28027923 | 0.75 | TSHR (0.51) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL9167203 | 0.74 | TSHR (0.46) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL11875789 | 0.74 | TSHR (0.50) | TSHRALDH1A1EPHX1NPSR1HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7364833-B2 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG ELECTRONICS CO., LTD (KR) | 2008-04-29 | — | — | US | claimed |
| US-20050266339-A1 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG DISPLAY CO., LTD. (KR) | 2005-12-01 | — | — | US | claimed |
| WO-2004107053-A1 | POSITIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | claimed |
| WO-2004107052-A1 | NEGATIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | claimed |
| WO-2004097522-A1 | NEGATIVE RESIST COMPOSITION FOR ORGANIC INSULATOR OF HIGH APERTURE LCD | ADMS TECHNOLOGY CO. LTD. (KR) | 2004-11-11 | — | — | WO | claimed |
| CN-108693710-B | Positive photosensitive polysiloxane composition | 奇美实业股份有限公司 | 2022-12-02 | — | — | CN | disclosed |
| EP-3438222-B1 | PHOTOCURABLE SEALANT COMPOSITION, COMMODITY, AND ORGANIC SOLAR CELL | ZEON CORP (JP) | 2022-05-04 | — | — | EP | disclosed |
| US-20190270919-A1 | PHOTOCURABLE SEALANT COMPOSITION, ARTICLE AND ORGANIC SOLAR CELL | ZEON CORPORATION (JP) | 2019-09-05 | — | — | US | disclosed |
| EP-3438222-A1 | PHOTOCURABLE SEALANT COMPOSITION, COMMODITY, AND ORGANIC SOLAR CELL | Zeon Corporation (JP) | 2019-02-06 | — | — | EP | disclosed |
| US-20150030836-A1 | POLYMERIZABLE COMPOSITION, POLYMERIZATION PRODUCT, IMAGE DISPLAY DEVICE, AND METHOD FOR PRODUCING SAME | SHOWA DENKO K.K. (JP) | 2015-01-29 | — | — | US | disclosed |
| US-20150005406-A1 | URETHANE (METH)ACRYLATE AND MOISTURE-PROOF INSULATING COATING MATERIAL | SHOWA DENKO K.K. (JP) | 2015-01-01 | — | — | US | disclosed |
| CN-100538517-C | Negative resist composition for organic insulating layer of high aperture LCD | ADMS TECHNOLOGY CO LTD (KR) | 2009-09-09 | — | — | CN | disclosed |
| US-7364833-B2 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG ELECTRONICS CO., LTD (KR) | 2008-04-29 | — | — | US | disclosed |
| CN-1781057-A | Negative resist composition for organic insulating layer of high aperture LCD | ADMS TECHNOLOGY CO LTD (KR) | 2006-05-31 | — | — | CN | disclosed |
| US-20050266339-A1 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG DISPLAY CO., LTD. (KR) | 2005-12-01 | — | — | US | disclosed |
| WO-2004107052-A1 | NEGATIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | disclosed |
| WO-2004107053-A1 | POSITIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | disclosed |
| WO-2004097522-A1 | NEGATIVE RESIST COMPOSITION FOR ORGANIC INSULATOR OF HIGH APERTURE LCD | ADMS TECHNOLOGY CO. LTD. (KR) | 2004-11-11 | — | — | WO | disclosed |