Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 6/20 | 0.40 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.33 |
| ▸ | TP53 | P04637 | 4/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | MITF | O75030 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | NLRP1 | Q9C000 | 1/20 | 0.33 |
| ▸ | GPR55 | Q9Y2T6 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4872016 | 0.84 | TSHR (0.55) | TSHREPHX1ALDH1A1TP53NPSR1 | |
| SCHEMBL4871767 | 0.74 | TSHR (0.43) | TSHREPHX1ALDH1A1NPSR1 | |
| SCHEMBL8408099 | 0.72 | TSHR (0.44) | TSHREPHX1ALDH1A1TP53NPSR1 | |
| SCHEMBL28069158 | 0.71 | ALDH1A1 (0.36) | TSHREPHX1ALDH1A1NPSR1SMN1; SMN2 | |
| SCHEMBL23494377 | 0.70 | TSHR (0.56) | TSHREPHX1ALDH1A1TP53NPSR1 | |
| SCHEMBL10493870 | 0.70 | CES2 (0.34) | EPHX1 | |
| SCHEMBL2893408 | 0.69 | EPHX1 (0.34) | TSHREPHX1ALDH1A1TP53NPSR1 | |
| SCHEMBL30819868 | 0.69 | EPHX1 (0.34) | TSHREPHX1ALDH1A1TP53NPSR1 | |
| SCHEMBL28136537 | 0.69 | TSHR (0.50) | TSHRALDH1A1TP53CYP3A4MAPT | |
| SCHEMBL4325855 | 0.69 | TSHR (0.53) | TSHREPHX1ALDH1A1TP53NPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116068853-A | Photosensitive resin composition and display device | 三星显示有限公司 | 2023-05-05 | — | — | CN | claimed |
| US-7364833-B2 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG ELECTRONICS CO., LTD (KR) | 2008-04-29 | — | — | US | claimed |
| US-20050266339-A1 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG DISPLAY CO., LTD. (KR) | 2005-12-01 | — | — | US | claimed |
| WO-2004107053-A1 | POSITIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | claimed |
| WO-2004107052-A1 | NEGATIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | claimed |
| WO-2004097522-A1 | NEGATIVE RESIST COMPOSITION FOR ORGANIC INSULATOR OF HIGH APERTURE LCD | ADMS TECHNOLOGY CO. LTD. (KR) | 2004-11-11 | — | — | WO | claimed |
| CN-116068853-A | Photosensitive resin composition and display device | 三星显示有限公司 | 2023-05-05 | — | — | CN | disclosed |
| CN-100538517-C | Negative resist composition for organic insulating layer of high aperture LCD | ADMS TECHNOLOGY CO LTD (KR) | 2009-09-09 | — | — | CN | disclosed |
| US-7364833-B2 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG ELECTRONICS CO., LTD (KR) | 2008-04-29 | — | — | US | disclosed |
| CN-1781057-A | Negative resist composition for organic insulating layer of high aperture LCD | ADMS TECHNOLOGY CO LTD (KR) | 2006-05-31 | — | — | CN | disclosed |
| US-20050266339-A1 | coating uniformity on large-scale substrate; acrylic ester polymer; mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM; photosensitizer | SAMSUNG DISPLAY CO., LTD. (KR) | 2005-12-01 | — | — | US | disclosed |
| WO-2004107053-A1 | POSITIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | disclosed |
| WO-2004107052-A1 | NEGATIVE PHOTORESIST COMPOSITION FOR SPINLESS (SLIT) COATING | ADMS TECHNOLOGY CO., LTD. (KR) | 2004-12-09 | — | — | WO | disclosed |
| WO-2004097522-A1 | NEGATIVE RESIST COMPOSITION FOR ORGANIC INSULATOR OF HIGH APERTURE LCD | ADMS TECHNOLOGY CO. LTD. (KR) | 2004-11-11 | — | — | WO | disclosed |